In this paper, we fabricated a fluorinated organic-inorganic hybrid mold using a nonhydrolytic sol-gel process which can produce a crack-free mold without leaving any trace of solvent. No special chemical treatment of a release layer is needed because the fluorinated hybrid mold has fluorine molecules in the backbone. The other advantages of the hybrid mold are thermal stability over 300 degrees C. The hybrid mold produced from UV nanoimprint lithography (UV-NIL) was used as a mold for the next UV-NIL and soft lithography without requiring use of an antisticking layer. Various nanometer scale patterns including sub-100 nm patterns could be obtained from the hybrid mold. Nanopatterning processes using this low-cost mold are useful because they preserve the expensive original master.

No abstract

No abstract

No abstract

No abstract

No abstract

No abstract

In this study, we propose a simple technique to enhance the efficiency of RF CMOS power amplifiers in which a cascode structure is utilized. To increase the efficiency in the low‐output‐power region, we split a common gate transistor into two parts. For the low‐output‐power mode, one of the common gate transistors is turned off to reduce the amount of DC power consumed. To verify the feasibility of the proposed split cascode structure, we designed a 2.2‐GHz CMOS power amplifier using the 180‐nm RF CMOS process. With a WCDMA modulated signal, we obtain a maximum‐output power of 23.4 dBm with 20.8% power‐added efficiency (PAE). At an output power of 16 dBm, the PAE is enhanced by the mode change of the designed power amplifier. From the measured results, we successfully verify the feasibility of the proposed split cascode structure for RF CMOS power amplifier applications. © 2016 Wiley Periodicals, Inc. Microwave Opt Technol Lett 58:309–312, 2016