Large area pattern replication by nanoimprint lithography for LCD–TFT application

Kim, Jeong-Gil; Sim, Young-suk; Cho, Youngtae; Seo, Jung-Woo; Kwon, Sin; Park, Jung‐Woo; Choi, Hyun-Ki; Kim, Hyuk; Lee, Sung‐Hee

doi:10.1016/j.mee.2009.05.006

Cited by 31 publications

(13 citation statements)

References 9 publications

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“…In Figure 4, a flat mold with nanostructures is used to imprint onto a polymethyl methacrylate (PMMA) layer, where the imprint force is provided by a roller press instead of imprinting the entire area using the stamp itself. This concept or technique is also observed in the work of Kim and the group [6]. Additionally, the roller may also be used to press a flexible polymer film onto the mold for imprinting via thermal NIL as observed in the work of Song et al [36] and Lim et al [37], as shown in Figures 5 and 6.…”

Section: Reviewmentioning

confidence: 79%

A review of roll-to-roll nanoimprint lithography

et al. 2014

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Since its introduction in 1995, nanoimprint lithography has been demonstrated in many researches as a simple, low-cost, and high-throughput process for replicating micro- and nanoscale patterns. Due to its advantages, the nanoimprint lithography method has been rapidly developed over the years as a promising alternative to conventional nanolithography processes to fulfill the demands generated from the recent developments in the semiconductor and flexible electronics industries, which results in variations of the process. Roll-to-roll (R2R) nanoimprint lithography (NIL) is the most demanded technique due to its high-throughput fulfilling industrial-scale application. In the present work, a general literature review on the various types of nanoimprint lithography processes especially R2R NIL and the methods commonly adapted to fabricate imprint molds are presented to provide a clear view and understanding on the nanoimprint lithography technique as well as its recent developments.PACS81.16.Nd

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Section: Reviewmentioning

confidence: 79%

A review of roll-to-roll nanoimprint lithography

et al. 2014

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“…These submicrometer-scale BG lines can be uniformly patterned using laser interference photolithography or nanoimprinting technology. With advances in nanoprinting technology, it is possible to produce fine patterns over large area [16]. This provides a promising way to realize BG in largescale production.…”

Section: Conduction Mechanism Of Bgmentioning

confidence: 99%

Bridged-Grain Solid-Phase-Crystallized Polycrystalline-Silicon Thin-Film Transistors

Zhou

Meng

Zhao

et al. 2012

IEEE Electron Device Lett.

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Novel bridged-grain (BG) technique is applied in the fabrication of low-temperature solid-phase-crystallized polycrystalline-silicon thin-film transistors. As a result of improved current flow and reduction of high drain electric field, the subthreshold slope, threshold voltage, maximum field-effect mobility, leakage current, and on-off ratio are greatly improved. Mechanisms of BG conduction are studied in detail.Index Terms-Bridged grain (BG), polycrystalline silicon (poly-Si), thin-film transistors (TFTs).

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“…This is due to the fact that conventional photolithography process requires multiple steps in fabrication of complicated threedimensional patterns which translates to low process throughput [1], in addition to its resolution limitations due to light diffraction factors [2]. More advanced techniques such as electron beam lithography (EBL) are better suited for fabrication of complicated, higher resolution nanometre-scale patterns; however, its relatively low throughput [3] made it unsuitable for mass production.…”

Section: Introductionmentioning

confidence: 99%

“…From various researches, various 2D and 3D structures [7] with feature sizes ranging from several micrometres [1,8] down to sub-50 nm [9][10][11] scale have been successfully replicated using NIL process. However, the conventional NIL method using plate-to-plate (P2P) contact is not suitable for large area imprinting due to its high-force [12] and vacuum environment requirements [7,9], low throughput [13,14] and non-uniformity issues [15].…”

Section: Introductionmentioning

confidence: 99%

Development of a low cost roll-to-roll nanoimprint lithography system for patterning 8-inch wide flexible substrates

Mohamed

Kooy

Ibrahim

2014

IJNT

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Recent developments in flexible electronics, solar cells, displays, bio-chips and wearable technology have featured various micro/nanostructures in system designs. However, fabricating these micro/nanostructures on flexible substrates using existing technology such as photolithography, electron beam lithography (EBL) and other lithography techniques is troublesome, time consuming and costly. An in-house roll-to-roll ultraviolet nanoimprint lithography (R2R-UVNIL) system was designed and fabricated as an alternative low cost and large area patterning tool. It consists of a coating unit, soft-bake unit and imprinting unit which are connected together using a series of rollers. The aim of the integrated soft-bake stage was to minimise the mould sticking issues during the continuous R2R imprinting using solvent-based resist. The assembled R2R-UVNIL system was tested with imprinting process on an untreated commercial polyethylene terephthalate (PET) film as the flexible substrate, solvent-based SU8-2002 photopolymer as the resist and PDMS soft mould as the imprinting mould. The PDMS soft mould was replicated from an EBL patterned silicon master mould. Imprinting speeds of 50 to 150 mm/min have been achieved in this work, with relatively sound replication quality and formability for patterning sub-2 µm microstructures.

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Large area pattern replication by nanoimprint lithography for LCD–TFT application

Cited by 31 publications

References 9 publications

A review of roll-to-roll nanoimprint lithography

A review of roll-to-roll nanoimprint lithography

Bridged-Grain Solid-Phase-Crystallized Polycrystalline-Silicon Thin-Film Transistors

Development of a low cost roll-to-roll nanoimprint lithography system for patterning 8-inch wide flexible substrates

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