A step-and-repeat UV-nanoimprint lithography process using an elementwise patterned stamp

Jeong, Jun‐Ho; Kim, Ki-don; Sim, Young-suk; Sohn, Hosik; Lee, Eung-Sug

doi:10.1016/j.mee.2005.07.013

Cited by 12 publications

(5 citation statements)

References 8 publications

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“…This scheme is good for nanoimprint mold creation. It is currently limited by the throughput, alignment and street width issues (Jeong et al, 2005).…”

Section: Large Area Imprintmentioning

confidence: 99%

Nanoimprint Lithography

강신일¹

2016

Encyclopedia of Nanotechnology

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“…This scheme is good for nanoimprint mold creation. It is currently limited by the throughput, alignment and street width issues (Jeong et al, 2005).…”

Section: Large Area Imprintmentioning

confidence: 99%

Nanoimprint Lithography

강신일¹

2016

Encyclopedia of Nanotechnology

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“…However, as the substrate must be attached to the roll, the substrate must be composed of a flexible material. Other methods of transferring a nanostructure to a large area are the step-and-repeat method and the step-and-flash imprint method [ 9 , 10 ]. In order to use a stamp in the step-and-repeat process, it is very important to sharpen the edge of the stamp to minimize hardening of the boundary during stamp production.…”

Section: Introductionmentioning

confidence: 99%

Fabrication of Nanostructures on a Large-Area Substrate with a Minimized Stitch Error Using the Step-and-Repeat Nanoimprint Process

Lim

Choi

et al. 2022

Materials

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Nanoimprint lithography (NIL) is suitable for achieving high uniformity and mass production. However, in conventional NIL, a stamp suitable for the substrate size is required to increase the substrate size. To address this issue, we fabricated nanostructures on a large-area substrate using step-and-repeat NIL after making a small stamp. A stamp was produced using glass, and a nano-pillar pattern with a diameter of 600 nm, an interval of 400 nm, and a height of 270 nm was used during the experiment. The area of the pattern on the stamp was 10 mm × 10 mm, and the step-and-repeat process was performed 25 times to transfer the nanostructures to a 4-inch substrate. In addition, stitch gaps were created between the patterns, which could decrease the performance upon future application. To minimize this stitch gap, a high-precision glass scale was attached to the stamp feeder to precisely control the position and to minimize the step difference. Moreover, an experiment was conducted to minimize the stitch gap by adjusting the movement interval of the stamp, and the stitch spacing was minimized by moving the stamp position by 9.97 mm. This approach will facilitate the manufacturing of large-area substrates and other structures in the future.

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“…This is based on the fact that a large portion of incident light is reflected at the interface formed between layers with a large difference in refractive index, which can be minimized by introducing an additional layer with an intermediate refractive index to create a more gradual change. In this study, we formed mesoporous ZnO pattern on glass substrates for light-scattering effect by using ultraviolet nanoimprint lithography (UV-NIL) [ 17 , 18 ]. The mesoporous ZnO pattern provides strong scattering of light since it has two light-scattering centers.…”

Section: Introductionmentioning

confidence: 99%

Improved conversion efficiency of amorphous Si solar cells using a mesoporous ZnO pattern

Kim

et al. 2014

Nanoscale Res Lett

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To provide a front transparent electrode for use in highly efficient hydrogenated amorphous silicon (a-Si:H) thin-film solar cells, porous flat layer and micro-patterns of zinc oxide (ZnO) nanoparticle (NP) layers were prepared through ultraviolet nanoimprint lithography (UV-NIL) and deposited on Al-doped ZnO (AZO) layers. Through this, it was found that a porous micro-pattern of ZnO NPs dispersed in resin can optimize the light-trapping pattern, with the efficiency of solar cells based on patterned or flat mesoporous ZnO layers increased by 27% and 12%, respectively.

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A step-and-repeat UV-nanoimprint lithography process using an elementwise patterned stamp

Cited by 12 publications

References 8 publications

Nanoimprint Lithography

Nanoimprint Lithography

Fabrication of Nanostructures on a Large-Area Substrate with a Minimized Stitch Error Using the Step-and-Repeat Nanoimprint Process

Improved conversion efficiency of amorphous Si solar cells using a mesoporous ZnO pattern

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