Fabrication of Nanostructures on a Large-Area Substrate with a Minimized Stitch Error Using the Step-and-Repeat Nanoimprint Process

Ha, Yeonjoo; Lim, Hyungjun; Choi, Hak-jong; Lee, Jaejong

doi:10.3390/ma15176036

Cited by 3 publications

(3 citation statements)

References 12 publications

(11 reference statements)

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“…Despite the rapid development of micro-nanofabrication technologies in the past few years [33][34][35][36], some problems still exist. For instance, the random distribution of deposited atoms during film deposition leads to non-uniformity in films, and the subsequent etching process is susceptible to loading effects, resulting in variations in etching depth [37][38][39][40][41].…”

Section: Introductionmentioning

confidence: 99%

The Effect of Height Error on Performance of Propagation Phase-Based Metalens

Qiu,

Deng,

Zhan

et al. 2024

Micromachines

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Metalenses, as a new type of planar optical device with flexible design, play an important role in miniaturized and integrated optical devices. Propagation phase-based metalenses, known for their low loss and extensive design flexibility, are widely utilized in optical imaging and optical communication. However, fabrication errors introduced by thin-film deposition and etching processes inevitably result in variations in the height of the metalens structure, leading to the fabricated devices not performing as expected. Here, we introduce a reflective TiO2 metalens based on the propagation phase. Then, the relationship between the height variation and the performance of the metalens is explored by using the maximum phase error. Our results reveal that the height error of the unit structure affects the phase rather than the amplitude. The focusing efficiency of our metalens exhibits robustness to structural variations, with only a 5% decrease in focusing efficiency when the height varies within ±8% of the range. The contents discussed in this paper provide theoretical guidance for the unit design of the propagation phase-based metalens and the determination of its allowable fabrication error range, which is of great significance for low-cost and high-efficiency manufacturing.

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Section: Introductionmentioning

confidence: 99%

The Effect of Height Error on Performance of Propagation Phase-Based Metalens

Qiu,

Deng,

Zhan

et al. 2024

Micromachines

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“…However, the leakage of UV light and overflow of imprint resin will impact the subsequent imprinting [ 30 , 31 ], leading to obvious seams that ultimately affect the functionality and efficiency of the resulting devices. To address these challenges, Lee, J et al addressed UV light leakage by applying a chromium layer to non-patterned mold areas, using collimated UV light [ 32 ]. However, UV light diffraction led to premature resin curing in subsequent areas.…”

Section: Introductionmentioning

confidence: 99%

Fabrication of Large-Area Nanostructures Using Cross-Nanoimprint Strategy

Zhan,

Deng,

Dai

et al. 2024

Nanomaterials

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Nanostructures with sufficiently large areas are necessary for the development of practical devices. Current efforts to fabricate large-area nanostructures using step-and-repeat nanoimprint lithography, however, result in either wide seams or low efficiency due to ultraviolet light leakage and the overflow of imprint resin. In this study, we propose an efficient method for large-area nanostructure fabrication using step-and-repeat nanoimprint lithography with a composite mold. The composite mold consists of a quartz support layer, a soft polydimethylsiloxane buffer layer, and multiple intermediate polymer stamps arranged in a cross pattern. The distance between the adjacent stamp pattern areas is equal to the width of the pattern area. This design combines the high imprinting precision of hard molds with the uniform large-area imprinting offered by soft molds. In this experiment, we utilized a composite mold consisting of three sub-molds combined with a cross-nanoimprint strategy to create large-area nanostructures measuring 5 mm × 30 mm on a silicon substrate, with the minimum linewidth of the structure being 100 nm. Compared with traditional step-and-flash nanoimprint lithography, the present method enhances manufacturing efficiency and generates large-area patterns with seam errors only at the micron level. This research could help advance micro–nano optics, flexible electronics, optical communication, and biomedicine studies.

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“…This project uses a variety of high refractive index nano-imprint materials, namely nano-imprint adhesive. Scholars query how each material is used, its spin curve, refractive index, and the structure data of the template, and repeat stamping the same structure with the same external factors [2] . After sample imprinting, several structural points were selected at the same location, and the effects of different high refractive index nanoimprint materials on structure morphology, height, and tilt angle were analyzed by scanning electron microscopy (SEM) [3] .…”

Section: Introductionmentioning

confidence: 99%

Preparation of Tilted Grating Structure by Nanoimprinting Material with High Refractive Index

Zhang

2023

J. Phys.: Conf. Ser.

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The vigorous development of the semiconductor industry has made people’s demand for semiconductor devices increasingly high, but with the shrinking specifications of components, traditional lithography technology has been unable to adapt to the needs of pattern refinement. In optical lithography, it is difficult to produce patterns with feature dimensions of less than 7 nm. Nano-embossing lithography technology, as the next generation of lithography technology, has reached a feature size of less than 5 nm, and even according to relevant reports, the processing accuracy of the technology has reached 2 nm. In this paper, we experimentally illustrate the structural change trend of the inclined grating structure after continuous imprinting, so that the structural height will show a downward trend with the increase of the number of embossing, and the line width of the structural plane will show an upward trend. The best effect is obtained by obtaining high refractive index glue 133 repetitive imprinting two kinds of inclined grating structures. And the nature of the embossing adhesive is proportional to its refractive index, and the higher the refractive index of the embossing adhesive with better imprinting properties.

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Fabrication of Nanostructures on a Large-Area Substrate with a Minimized Stitch Error Using the Step-and-Repeat Nanoimprint Process

Cited by 3 publications

References 12 publications

The Effect of Height Error on Performance of Propagation Phase-Based Metalens

The Effect of Height Error on Performance of Propagation Phase-Based Metalens

Fabrication of Large-Area Nanostructures Using Cross-Nanoimprint Strategy

Preparation of Tilted Grating Structure by Nanoimprinting Material with High Refractive Index

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