UV-nanoimprint lithography using an elementwise patterned stamp

Jeong, Jun‐Ho; Sim, Young-suk; Sohn, Hosik; Lee, Eung-Sug

doi:10.1016/j.mee.2004.04.003

Cited by 30 publications

(17 citation statements)

References 8 publications

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“…2 , an elementwise patterned stamp (EPS) for large-area pattering at atmospheric pressure and room temperature, was made using E-beam lithography and wet etching. Experimental details of the fabrication of the EPS stamp can be found in our previous report . Each element was separated by channels with a depth of 1 μm and a width of 5 mm (see Figure S1 for details of stamp).…”

Section: Fabrication Of a Fluorinated Hybrid Moldmentioning

confidence: 99%

Fluorinated Organic−Inorganic Hybrid Mold as a New Stamp for Nanoimprint and Soft Lithography

et al. 2005

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In this paper, we fabricated a fluorinated organic-inorganic hybrid mold using a nonhydrolytic sol-gel process which can produce a crack-free mold without leaving any trace of solvent. No special chemical treatment of a release layer is needed because the fluorinated hybrid mold has fluorine molecules in the backbone. The other advantages of the hybrid mold are thermal stability over 300 degrees C. The hybrid mold produced from UV nanoimprint lithography (UV-NIL) was used as a mold for the next UV-NIL and soft lithography without requiring use of an antisticking layer. Various nanometer scale patterns including sub-100 nm patterns could be obtained from the hybrid mold. Nanopatterning processes using this low-cost mold are useful because they preserve the expensive original master.

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Section: Fabrication Of a Fluorinated Hybrid Moldmentioning

confidence: 99%

Fluorinated Organic−Inorganic Hybrid Mold as a New Stamp for Nanoimprint and Soft Lithography

et al. 2005

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“…In this study, we fabricated high quality wafer scale Fe-nanostripe thin films by deposition of materials through e-beam evaporation onto patterned topographical gratings on a substrate made by UV-assisted nanoimprint lithography (UV-NIL) [29][30][31] . We chose polyethylene terephthalate (PET) substrate due to its ready availability, flexibility, high mechanical, chemical stability and low cost.…”

Section: Introductionmentioning

confidence: 99%

Fabrication of flexible oriented magnetic thin films with large in-plane uniaxial anisotropy by roll-to-roll nanoimprint lithography

Thantirige

John

Pradhan

et al. 2016

Journal of Magnetism and Magnetic Materials

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Here, we report wafer scale fabrication of densely packed Fe nanostripe-based magnetic thin films on a flexible substrate and their magnetic anisotropy properties. We find that Fe nanostripes exhibit large in-plane uniaxial anisotropy and nearly square hysteresis loops with energy products (BH)max exceeding 3 MGOe at room temperature. High density Fe nanostripes were fabricated on 70 nm flexible polyethylene terephthalate (PET) gratings, which were made by roll-to-roll (R2R) UV nanoimprintlithography technique. Observed large in-plane uniaxial anisotropies along the long dimension of nanostripes are attributed to the shape. Temperature dependent hysteresis measurements confirm that the magnetization reversal is driven by noncoherent rotation reversal processes.

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“…This is based on the fact that a large portion of incident light is reflected at the interface formed between layers with a large difference in refractive index, which can be minimized by introducing an additional layer with an intermediate refractive index to create a more gradual change. In this study, we formed mesoporous ZnO pattern on glass substrates for light-scattering effect by using ultraviolet nanoimprint lithography (UV-NIL) [17,18]. The mesoporous ZnO pattern provides strong scattering of light since it has two light-scattering centers.…”

Section: Introductionmentioning

confidence: 99%

Improved conversion efficiency of amorphous Si solar cells using a mesoporous ZnO pattern

Kim

et al. 2014

Nanoscale Res Lett

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To provide a front transparent electrode for use in highly efficient hydrogenated amorphous silicon (a-Si:H) thin-film solar cells, porous flat layer and micro-patterns of zinc oxide (ZnO) nanoparticle (NP) layers were prepared through ultraviolet nanoimprint lithography (UV-NIL) and deposited on Al-doped ZnO (AZO) layers. Through this, it was found that a porous micro-pattern of ZnO NPs dispersed in resin can optimize the light-trapping pattern, with the efficiency of solar cells based on patterned or flat mesoporous ZnO layers increased by 27% and 12%, respectively.

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UV-nanoimprint lithography using an elementwise patterned stamp

Cited by 30 publications

References 8 publications

Fluorinated Organic−Inorganic Hybrid Mold as a New Stamp for Nanoimprint and Soft Lithography

Fluorinated Organic−Inorganic Hybrid Mold as a New Stamp for Nanoimprint and Soft Lithography

Fabrication of flexible oriented magnetic thin films with large in-plane uniaxial anisotropy by roll-to-roll nanoimprint lithography

Improved conversion efficiency of amorphous Si solar cells using a mesoporous ZnO pattern

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