This work presents a physically based model for double-gate junctionless transistors (JLTs), continuous in all operation regimes. To describe short-channel transistors, short-channel effects (SCEs), such as increase of the channel potential due to drain bias, carrier velocity saturation and mobility degradation due to vertical and longitudinal electric fields, are included in a previous model developed for long-channel double-gate JLTs. To validate the model, an analysis is made by using three-dimensional numerical simulations performed in a Sentaurus Device Simulator from Synopsys. Different doping concentrations, channel widths and channel lengths are considered in this work. Besides that, the series resistance influence is numerically included and validated for a wide range of source and drain extensions. In order to check if the SCEs are appropriately described, besides drain current, transconductance and output conductance characteristics, the following parameters are analyzed to demonstrate the good agreement between model and simulation and the SCEs occurrence in this technology: threshold voltage (V TH ), subthreshold slope (S) and drain induced barrier lowering.
The development of quantum electronic devices operating below a few Kelvin degrees is raising the demand for cryogenic complementary metal-oxide-semiconductor electronics (CMOS) to be used as in situ classical control/readout circuitry. Having a minimal spatial separation between quantum and classical hardware is necessary to limit the electrical wiring to room temperature and the associated heat load and parasitic capacitances. Here, we report prototypical demonstrations of hybrid circuits combining silicon quantum dot devices and a classical transimpedance amplifier, which is characterized and then used to measure the current through the quantum dots. The two devices are positioned next to each other at 4.2 K to assess the use of the cryogenic transimpedance amplifier with respect to a room-temperature transimpedance amplifier. A quantum device built on the same substrate as the transimpedance amplifier is characterized down to 10 mK. The transimpedance amplifier is based on commercial 28 nm fully depleted Silicon-on-insulator (FDSOI) CMOS. It consists of a two-stage Miller-compensated operational amplifier with a 10 MΩ polysilicon feedback resistor, yielding a gain of 1.1×107 V/A. We show that the transimpedance amplifier operates at 10 mK with only 1 μW of power consumption, low enough to prevent heating. It exhibits linear response up to ±40 nA and a measurement bandwidth of 2.6 kHz, which could be extended to about 200 kHz by design optimization. The realization of custom-made electronics in FDSOI technology for cryogenic operation at any temperature will improve measurement speed and quality inside cryostats with higher bandwidth, lower noise, and higher signal-to-noise ratio.
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