When epitaxial graphene layers are formed on SiC͑0001͒, the first carbon layer ͑known as the "buffer layer"͒, while relatively easy to synthesize, does not have the desirable electrical properties of graphene. The conductivity is poor due to a disruption of the graphene bands by covalent bonding to the SiC substrate. Here we show that it is possible to restore the graphene bands by inserting a thin oxide layer between the buffer layer and SiC substrate using a low temperature, complementary metal-oxide semiconductor-compatible process that does not damage the graphene layer.

We have used in situ low-energy electron microscopy (LEEM) to correlate the atomic and electronic structure of graphene films on polycrystalline Ni with nm-scale spatial resolution. Spatially resolved electron scattering measurements show that graphene monolayers formed by carbon segregation do not support the π-plasmon of graphene, indicating strong covalent bonding to the Ni. Graphene bilayers have the Bernal stacking characteristic of graphite and show the expected plasmon loss at 6.5 eV. The experimental results, in agreement with first-principles calculations, show that the π-band structure of free-standing graphene appears only in films with a thickness of at least two layers and demonstrate the sensitivity of the plasmon loss to the electronic structure.

We describe a process for the growth of a single, electronically decoupled graphene layer on SiC(0001). The method involves annealing in disilane to (1) prepare flat, clean substrates, (2) grow a single graphene layer, and (3) electronically decouple the graphene from the substrate. This approach uses a single process gas, at μTorr pressures, with modest substrate temperatures, thus affecting a drastic simplification over other processes described in the literature.

Depth profiling of graphene with high-resolution ion beam analysis is a practical method for analysis of monolayer thicknesses of graphene. Not only is the energy resolution sufficient to resolve graphene from underlying SiC, but by use of isotope labeling it is possible to tag graphene generated from reacted ethylene. Furthermore, we are able to analyze graphene supported by oxidized Si(100) substrates, allowing the study of graphene films grown by chemical vapor deposition on metal and transferred to silicon. This introduces a powerful method to explore the fundamentals of graphene formation.

We have developed an electron lithography method, hot electron emission lithography, which is capable of printing integrated circuits with an exposure time of only a few seconds. The basic design and fabrication of the patterned electron emitting mask made by standard metal–oxide–semiconductor technology will be discussed, and its applicability in a simple 1:1 e-beam stepper will be demonstrated. Patterns with a minimum feature size of 160 nm have been printed successfully. Further improvements in resolution to 50 nm appear to be possible.

We describe the design and practical realization of a versatile sample stage with six degrees of freedom. The stage was designed for use in a Low Energy Electron Microscope, but its basic design features will be useful for numerous other applications. The degrees of freedom are X, Y, and Z, two tilts, and azimuth. All motions are actuated in an ultrahigh vacuum base pressure environment by piezoelectric transducers with integrated position sensors. The sample can be load-locked. During observation, the sample is held at a potential of -15 kV, at temperatures between room temperature and 1500 °C, and in background gas pressures up to 1 × 10(-4) Torr.

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We describe a simple method to detect the formation of graphene during Si sublimation from SiC surfaces at elevated temperature. The method exploits differences in the thermionic emission current density between graphene and SiC. When graphene forms, the thermionic current from the sample increases by a factor of about 20. The increase in thermionic emission can be detected in situ using a biased plate located near the sample. The ability to detect when graphene forms during processing is useful in optimizing graphene synthesis processes.