2010
DOI: 10.1103/physrevb.82.041411
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Decoupling graphene from SiC(0001) via oxidation

Abstract: When epitaxial graphene layers are formed on SiC͑0001͒, the first carbon layer ͑known as the "buffer layer"͒, while relatively easy to synthesize, does not have the desirable electrical properties of graphene. The conductivity is poor due to a disruption of the graphene bands by covalent bonding to the SiC substrate. Here we show that it is possible to restore the graphene bands by inserting a thin oxide layer between the buffer layer and SiC substrate using a low temperature, complementary metal-oxide semicon… Show more

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Cited by 118 publications
(101 citation statements)
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References 24 publications
(40 reference statements)
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“…Recent experiments, performed using mainly LEEM microscopy, Core level photoemission (XPS), and Electron Energy Loss Spectroscopy (EELS), have demonstrated that the graphene π band of the buffer layer can be restored by the insertion of a thin oxide layer between the buffer layer and the SiC substrate [11]. However, none of these works is centered on the effect of oxidation on the electronic properties.…”
Section: Introductionmentioning
confidence: 99%
“…Recent experiments, performed using mainly LEEM microscopy, Core level photoemission (XPS), and Electron Energy Loss Spectroscopy (EELS), have demonstrated that the graphene π band of the buffer layer can be restored by the insertion of a thin oxide layer between the buffer layer and the SiC substrate [11]. However, none of these works is centered on the effect of oxidation on the electronic properties.…”
Section: Introductionmentioning
confidence: 99%
“…E-mail: Thomas.Seyller@physik.tu-chemnitz.de (Thomas Seyller) dependent [4] and it has been observed that this is a direct consequence of the presence of the buffer layer [10]. In recent years, various elements such as gold [11], lithium [12], silicon [13], fluorine [14], germanium [15], oxygen [16][17][18][19] and hydrogen [10,[20][21][22][23] have been intercalated between the buffer layer and SiC(0001) in order to modify the interface.…”
Section: Introductionmentioning
confidence: 99%
“…Oida et al [16] have investigated the intercalation of molecular oxygen under the buffer layer using a lowtemperature oxidation process (T = 250 °C, p = 1 atm, t = 5 s). They observed the formation of a 3 Å thick oxide layer below the buffer layer.…”
Section: Introductionmentioning
confidence: 99%
“…Therefore this buffer layer is considered to be a main obstacle to the development of future electronic devices based on graphene grown on SiC(0001). Nonetheless, earlier studies have demonstrated that this buffer layer can be decoupled from the substrate and transformed into a graphene layer by hydrogen (H) [6,[10][11][12], gold (Au) [13], oxygen (O 2 ) [14] and lithium (Li) [15][16] intercalation.…”
Section: Introductionmentioning
confidence: 99%