Hot electron emission lithography

Abstract

We have developed an electron lithography method, hot electron emission lithography, which is capable of printing integrated circuits with an exposure time of only a few seconds. The basic design and fabrication of the patterned electron emitting mask made by standard metal–oxide–semiconductor technology will be discussed, and its applicability in a simple 1:1 e-beam stepper will be demonstrated. Patterns with a minimum feature size of 160 nm have been printed successfully. Further improvements in resolution to 50 nm appear to be possible.

Highly Monochromatic Electron Emission from Graphene/Hexagonal Boron Nitride/Si Heterostructure

“…Planar metal-oxide-semiconductor (MOS) electron emission devices − have excellent attributes, such as a low driving voltage, they function at low , and atmospheric pressures , and in liquids, − and have a low divergence angle for the electron beam . Several practical applications have been proposed, including in field emission displays, , in highly sensitive image sensors, − and for electron beam lithography systems. − The electron emission source plays a critical role in the performance of electron microscopy setups, such as scanning electron microscopes (SEM), transmission electron microscopes (TEM), and electron beam lithography. Compared with Schottky-type electron sources and tungsten field emitters, MOS-type electron emission devices are disadvantaged by their broad emitted electron energy spread.…”

High-performance planar-type electron source based on a graphene-oxide-semiconductor structure

“…Planar-type electron sources based on a metal-oxide-semiconductor structure (MOS) can be operated at low vacuum, low voltage, and room temperature conditions [14][15][16][17], and 3 emit electron beams with small divergence angles [18]. Although these features are advantageous for the several applications, such as low-cost, high-resolution electron microscopes, highly sensitive image sensors [19], field emission displays [20], and electron beam lithography [21,22], they have a very low electron emission efficiency of 0.002 % [16].…”

A new technique for fabricating three-dimensional micro- and nanostructures of various shapes

“…An array of tips as shown in figure 4(d) leads to a high density of almost atomically sharp tips, which can be used to fabricate hot-electron emitters producing very high currents from small areas. Moreover, it is envisioned that such tips might be used in nanolithography using hot-electron emission [7] or by the millipede concept [8].…”