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We have developed hydrogenated microcrystalline silicon germanium, which exhibits a red-shifted absorption spectrum relative to hydrogenated microcrystalline silicon, as a candidate material for the bottom cell of amorphous silicon-based tandem solar cells. Optical absorption, x-ray diffraction, and Raman scattering spectra are presented in addition to optoelectronic properties and light-induced changes.

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We have investigated the role of hydrogen in hydrogenated microcrystalline silicon (μc-Si:H) formation using hydrogen plasma treatments, in particular examining the possibility of subsurface reaction due to permeating hydrogen atoms, which leads to the crystallization of hydrogenated amorphous silicon (a-Si:H). It is demonstrated that the hydrogen plasma treatment of a-Si:H film on the anode using a cathode covered by a-Si:H film, which is inevitably coated during the deposition period, gives rise to the deposition of μc-Si:H over the a-Si:H layer, i.e., chemical transport takes place. It is also found that the pure hydrogen plasma treatment using a clean cathode induces only etching of the a-Si:H layer. These results imply that the present hydrogen plasma condition does not cause crystallization of a-Si:H but only etching, and that careful experimentation is required to determine the real subsurface reaction due to atomic hydrogen.

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The role of hydrogen atoms in the formation process of hydrogenated microcrystalline silicon (μc-Si:H) by plasma enhanced chemical vapor deposition method has been investigated. Under the present conditions, the etching and the permeation of hydrogen atoms in the subsurface region do not cause the crystallization. The kinetics study of surface morphology and structure in the initial growth of μc-Si:H on an atomically flat substrate indicates that the onset thickness of island coalescence reduced under μc-Si:H formation condition. The results support the ‘surface diffusion model’ in which the surface diffusion of film precursors is enhanced by the sufficient hydrogen coverage of surface and by hydrogen atom recombination energy on the growing surface of the film.

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A SiH4/H2 VHF plasma with a frequency of 60 MHz was produced with a multi‐rod electrode of 1 200 × 114 mm2 at high pressure. The plasma parameters were measured as a function of pressure and concentration of SiH4 to H2 with a tiny heated Langmuir probe. When the pressure was increased, the plasma density decreased independent of the concentration of SiH4 to H2, while the electron temperature increased to about 11 eV at 3 Torr. The wall potential defined as the potential difference between the plasma potential and the floating potential was anomalously small at high pressure, suggesting very low ion bombardment. Furthermore, Langmuir probe characteristics indicated that there exist much negative ions.