Large area VHF plasma production by a balanced power feeding method

Nishimiya, T.; Takeuchi, Yoshinori; Yamauchi, Yasuhiro; Takatsuka, Hiromu; Shioya, Takeshi; Muta, Hiroshi; Kawai, Yoshinobu

doi:10.1016/j.tsf.2007.10.016

Cited by 29 publications

(32 citation statements)

References 13 publications

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“…There is no theory to estimate dominant ion species from the sheath potential measurements in the case where there are negative ions. Furthermore, in the case of a short discharge gap, the electron temperature was relatively high [7]. However, as seen in Fig.…”

Section: Resultsmentioning

confidence: 87%

“…The distance between the multi rod electrode and the glass substrate was 34 mm, where a punched electrode (stainless-steel-disk plate) of 1200 mm x 114 mm was used as a substrate holder to look at plasma uniformity. The VHF power source with frequency of 60 MHz was used and the power was150 W, where we used a balanced power feeding method [7] to produce a stable VHF plasma. Here the forward and reflected RF power was measured with a power meter.…”

Section: Introductionmentioning

confidence: 99%

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Dominant ion species in VHF SiH₄/H₂ plasma

Yamauchi

Baba

Yamane

et al. 2010

Phys. Status Solidi (c)

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Dominant ion species in VHF SiH4/H2 plasma (frequency 60 MHz) were estimated from the sheath potential and the electron temperature measured with the Langmuir probe. As the concentration of SiH4/H2 was increased, the transition of dominant ion species from H+ to SiH3+ was observed. When the discharge gap was shorter than 10 mm, measured sheath potentials were anomalously low compared with the calculated ones (© 2010 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)

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Section: Resultsmentioning

confidence: 87%

Section: Introductionmentioning

confidence: 99%

Dominant ion species in VHF SiH₄/H₂ plasma

Yamauchi

Baba

Yamane

et al. 2010

Phys. Status Solidi (c)

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“…[6] Here, a balanced power feeding method [7] was adopted to prevent anomalous discharges on power feeding cables. The VHF power was divided using a power divider consisting of two outputs with a 1808 phase difference, and the output powers were fed to two parallel plate electrodes through semirigid coaxial cables.…”

Section: Experimental Methodsmentioning

confidence: 99%

Observation of Bi‐Maxwellian Distributions in a H₂ Plasma Produced by a Narrow Gap VHF Discharge

Chen

Chiu

Chen

et al. 2015

Plasma Processes & Polymers

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A capacitively coupled VHF H 2 plasma (60 MHz) was produced by a narrow gap discharge at high pressures, and spatial distributions of the plasma parameters were examined with the Langmuir probe. A bi-Maxwellian electron distribution was observed near the discharge electrode while a Maxwellian one near the center of the inter-electrode gap. The simulation using the PIC code showed that electrons had the Druyvesteyn-like distribution near the discharge electrode.

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“…As shown in Fig. 1a), we developed a balanced power feeding method using a power divider consisted of two outputs with 180 degree phase difference [7]. The VHF power was supplied to the feeding point on the multi rod electrode and a punched electrode through an impedance matching box.…”

Section: Methodsmentioning

confidence: 99%

“…In this paper, as a first step of the work on the characteristics of SiH 4 /H 2 VHF plasma, we investigated the characteristics of VHF hydrogen plasma with the Langmuir probe, where the VHF plasma was produced with a multi rod electrode [7] and the discharge gap was 5 mm.…”

Section: Introductionmentioning

confidence: 99%

Characteristics of VHF H₂ Plasma Produced at High Pressure

Yamauchi

Takeuchi

Takatsuka

et al. 2008

Contrib. Plasma Phys.

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A VHF H2 plasma was produced with the multi rod electrode at high pressure and the plasma parameters were measured as a function of pressure for different VHF powers at 60 MHz. It was found that when the pressure is increased, the ion saturation current peaks at certain pressure and finally decreases at high pressures, while the electron temperature is around 10 eV. The wall potential at high pressure was lower than the values estimated from the electron temperature using the probe theory. Furthermore, the anomalous reduction of the electron saturation current was observed.

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Large area VHF plasma production by a balanced power feeding method

Cited by 29 publications

References 13 publications

Dominant ion species in VHF SiH₄/H₂ plasma

Dominant ion species in VHF SiH₄/H₂ plasma

Observation of Bi‐Maxwellian Distributions in a H₂ Plasma Produced by a Narrow Gap VHF Discharge

Characteristics of VHF H₂ Plasma Produced at High Pressure

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Large area VHF plasma production by a balanced power feeding method

Cited by 29 publications

References 13 publications

Dominant ion species in VHF SiH4/H2 plasma

Dominant ion species in VHF SiH4/H2 plasma

Observation of Bi‐Maxwellian Distributions in a H2 Plasma Produced by a Narrow Gap VHF Discharge

Characteristics of VHF H2 Plasma Produced at High Pressure

Contact Info

Product

Resources

About

Dominant ion species in VHF SiH₄/H₂ plasma

Dominant ion species in VHF SiH₄/H₂ plasma

Observation of Bi‐Maxwellian Distributions in a H₂ Plasma Produced by a Narrow Gap VHF Discharge

Characteristics of VHF H₂ Plasma Produced at High Pressure