Large Area SiH4/H2 VHF Plasma Produced with Multi-Rod Electrode

Abstract

A SiH4/H2 VHF plasma with a frequency of 60 MHz was produced with a multi‐rod electrode of 1 200 × 114 mm2 at high pressure. The plasma parameters were measured as a function of pressure and concentration of SiH4 to H2 with a tiny heated Langmuir probe. When the pressure was increased, the plasma density decreased independent of the concentration of SiH4 to H2, while the electron temperature increased to about 11 eV at 3 Torr. The wall potential defined as the potential difference between the plasma potential and the floating potential was anomalously small at high pressure, suggesting very low ion bombardment. Furthermore, Langmuir probe characteristics indicated that there exist much negative ions.

Electromagnetic, complex image model of a large area RF resonant antenna as inductive plasma source

“…The self-consistent calculation of antenna currents and voltages coupled by the mutual inductance matrix and the capacitance matrix is achieved here by considering the array of antenna legs as a MTL [24] coupled with the plasma. These considerations could also be relevant to other large area antenna reactor designs [1][2][3] such as the ladder antenna [23,[32][33][34][35][36][37][38][39][40][41][42][43], the serpentine antenna [10,12,44], the U-type antenna [45][46][47] and the double comb-type antenna [48][49][50].…”

“…Large area ICP sources are often an array of parallel linear legs [40]. The legs can be immersed in the plasma, with the legs individually isolated by a dielectric sleeve (serpentine [10,12,44], U-shape [45][46][47], comb-type [48,49]), or directly exposed to the plasma (for example, versions of the ladder type [2,36,40]). Alternatively, the whole ICP antenna can be embedded in a dielectric, protected from the plasma by a thin window [22,[56][57][58][59].…”

Microelectric Discharge Plasma: Characterization and Applications

“…There are several reports with different anode-cathode configurations such as planer electrodes [8], flat and point electrode [9], wire electrode and plate electrode [10], rod electrodes [11], co-planer electrodes [12], and many more. Above said configurations are mostly the combinations of metals.…”

Electron energy distribution functions relevant for weakly ionized SiH4–H2plasma

“…Hydrogenated amorphous silicon (a-Si:H) and hydrogenated microcrystalline silicon (µc-Si:H) films are extensively applied to solar panels, thin film transistors and flat panel displays [1][2][3]. Such films are typically deposited by SiH 4 -H 2 discharge, a process involving complex physicochemical phenomena.…”