Hall effect and capacitance-voltage C(V) measurements were performed on p-type GaN:Mg layers grown on GaN templates by molecular beam epitaxy with a high range of Mg-doping concentrations. The free hole density and the effective dopant concentration NA−ND as a function of magnesium incorporation measured by secondary ion mass spectroscopy clearly reveal both a magnesium doping efficiency up to 90% and a strong dependence of the acceptor ionization energy Ea with the acceptor concentration NA. These experimental observations highlight an isolated acceptor binding energy of 245±25 meV compatible, at high acceptor concentration, with the achievement of p-type GaN:Mg layers with a hole concentration at room temperature close to 1019 cm−3.
Although zinc oxide is a promising material for the fabrication of short wavelength optoelectronic devices, p-type doping is a step that remains challenging for the realization of diodes. Out of equilibrium methods such as ion implantation are expected to dope ZnO successfully provided that the non-radiative defects introduced by implantation can be annealed out. In this study, ZnO substrates are implanted with nitrogen ions, and the extended defects induced by implantation are studied by transmission electron microscopy and X-ray diffraction (XRD), before and after annealing at 900 • C. Before annealing, these defects are identified to be dislocation loops lying either in basal planes in high N concentration regions, or in prismatic planes in low N concentration regions, together with linear dislocations. An uniaxial deformation of 0.4% along the c axis, caused by the predominant basal loops, is measured by XRD in the implanted layer. After annealing, prismatic loops disappear while the density of basal loops decreases and their diameter increases. Moreover, dislocation loops disappear completely from the sub-surface region. XRD measurements show a residual deformation of only 0.05% in the implanted and annealed layer. The fact that basal loops are favoured against prismatic ones at high N concentration or high temperature is attributed to a lower stacking fault energy in these conditions. The coalescence of loops and their disappearance in the sub-surface region are ascribed to point defect diffusion. Finally, the electrical and optical properties of nitrogen-implanted ZnO are correlated with the observed structural features.
We report on the electrical, optical and photoluminescence properties of industry-ready Al doped ZnO thin films grown by physical vapor deposition, and their evolution after annealing under vacuum. Doping ZnO with Al atoms increases the carrier density but also favors the formation of Zn vacancies, thereby inducing a saturation of the conductivity mechanism at high aluminum content. The electrical and optical properties of these thin layered materials are both improved by annealing process which creates oxygen vacancies that releases charge carriers thus improving the conductivity. This study underlines the effect of the formation of extrinsic and intrinsic defects in Al doped ZnO compound during the fabrication process. The quality and the optoelectronic response of the produced films are increased (up to 1.52 and 3.73 eV) and consistent with the industrial device requirements.
The electrical properties of ZnO mono-crystalline materials, either in the form of bulk crystals or epitaxial films, were investigated for a large range of un-intentional or intentional doping concentrations extending from 4.0×1015 cm−3 up to 1.3×1020 cm−3. Hall and resistivity measurements were carried out from 10 K to 300 K, yielding the temperature dependent carrier densities and carrier mobilities. This allowed for an unambiguous determination of the dopant ionization energies, taking into account the concentration of compensation centers. The ionization energy variation as a function of dopant concentration was found to follow Mott's law, being consistent with the hydrogenic behavior of all involved donors; an effective critical Mott's concentration for the insulator to metal transition was found to be around 4.2×1018 cm−3, while the apparent value of the isolated donor ionization energy was determined as being 60 meV.
International audienceThe residual n-type conductivity of O-polar hydrothermally grown ZnO single crystals and the role of annealing on the transport properties are assessed by temperature dependent Hall measurements on a wide 20-800 K temperature range. A deep level lying 250 meV below the conduction band is responsible for the residual n-type conductivity of unannealed samples. After annealing, a shallow donor level with 25 meV ionization energy becomes responsible for the sample conductivity in the room temperature range. Thanks to high temperature Hall measurement, the coexistence of the deep and the shallow level has been demonstrated in the case of annealed sample
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