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For the first time, the I-V-T dataset of a Schottky diode has been accurately modelled, parameterised, and fully fit, incorporating the effects of interface inhomogeneity, patch pinch-off and resistance, and ideality factors that are both heavily temperature and voltage dependent. A Ni/SiC Schottky diode is characterised at 2 K intervals from 20 to 320 K, which, at room temperature, displays low ideality factors (n < 1.01) that suggest that these diodes may be homogeneous. However, at cryogenic temperatures, excessively high (n > 8), voltage dependent ideality factors and evidence of the so-called "thermionic field emission effect" within a T0-plot, suggest significant inhomogeneity. Two models are used, each derived from Tung's original interactive parallel conduction treatment of barrier height inhomogeneity that can reproduce these commonly seen effects in single temperature I-V traces. The first model incorporates patch pinch-off effects and produces accurate and reliable fits above around 150 K, and at current densities lower than 10 À5 A cm À2. Outside this region, we show that resistive effects within a given patch are responsible for the excessive ideality factors, and a second simplified model incorporating these resistive effects as well as pinch-off accurately reproduces the entire temperature range. Analysis of these fitting parameters reduces confidence in those fits above 230 K, and questions are raised about the physical interpretation of the fitting parameters. Despite this, both methods used are shown to be useful tools for accurately reproducing I-V-T data over a large temperature range. V

Here a physically based channel mobility model has been developed to investigate the temperature dependence of the field-effect mobility of 4H-SiC metal-oxide-semiconductor (MOS) transistors with thermally oxidized gate insulators. This model has been designed so that it accounts for the high density of traps at the MOS interface. This temperature dependence is a key issue for silicon carbide electronics, as its basic material properties make it the foremost semiconductor for high power/high temperature electronic devices in applications such as spacecraft, aircraft, automobile, and energy distribution. Our modeling suggests that the high density of charged acceptor interface traps, encountered in thermally grown gate oxides, modulates the channel mobility due to the Coulomb scattering of free carriers in the inversion layer. When the temperature increases, the field-effect mobility of these devices also increases, due to an increase in inversion charge and a reduction of the trapped charge. Experimental data of the field-effect mobility temperature dependence are in good agreement with this model.

In this paper we investigate the physical and electrical properties of silicon layers grown by molecular beam epitaxy on 4H-SiC substrates, evaluating the effect of the Si doping, Si temperature deposition, and SiC surface cleaning procedure. Si∕SiC monolithic integration of Si circuits with SiC power devices can be considered as an attractive proposition and has the potential to be applied to a broad range of applications. X-ray diffraction and scanning electron microscopy are used to determine the Si crystal structure (cubic silicon) and morphology. I-V and C-V measurements are performed to evaluate the rectifying diode characteristics along with the Si∕SiC built-in potential and energy band offsets. In the last section, we propose that our Si∕SiC heteojunction diode current characteristics can be explained by an isojunction drift-diffusion and thermoionic emission model where the effect of doping concentration of the silicon layer and its conduction band offset with SiC is analyzed.

As GaN technology continues to gain popularity, it is necessary to control the ohmic contact properties and to improve device consistency across the whole wafer. In this paper, we use a range of submicron characterization tools to understand the conduction mechanisms through the AlGaN/GaN ohmic contact. Our results suggest that there is a direct path for electron flow between the two dimensional electron gas and the contact pad. The estimated area of these highly conductive pillars is around 5% of the total contact area. (C) 2011 American Institute of Physics. [doi:10.1063/1.3661167

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The use of ultra-wide bandgap transparent conducting beta gallium oxide (-Ga 2 O 3) thin films as electrodes in ferroelectric solar cells is reported. In a new material structure for energy applications, we report a solar cell structure (a light absorber sandwiched in between two electrodes-one of them-transparent) which is not constrained by the Shockley-Queisser limit for open-circuit voltage (V oc) under typical indoor light. The solar blindness of the electrode enables a record-breaking bulk photovoltaic effect (BPE) with white light illumination (general use indoor light). This work opens up the perspective of ferroelectric photovoltaics which are not subject to the Shockley-Queisser limit by bringing into scene solar-blind conducting oxides.