This paper studies the effect of emitter width on the dc current gain, β F , and ac figures of merit, cut-off frequency, f T , and maximum oscillation frequency, f max , of realistic structures for 200 GHz SiGe heterojunction bipolar transistors (HBTs) using two-dimensional drift-diffusion (DD), hydrodynamic (HD) and energy balance (EB) simulations. The carrier transport models used are briefly presented. The SiGe-HBTs studied have a base thickness of 15 nm. Results of the three transport models are shown and analyzed, for the different emitter geometries.
A 2D model for Cu(In,Ga)Se 2 (CIGS) solar cells under low solar concentration is described and contrasted with experimental data. Using simulation, the effect of front electric contact design parameters: finger width, finger separation, and number of buses are analyzed for solar concentrations from 1 up to 10 suns. Efficiency maps allowing front contact grid optimization are shown and analyzed for each concentration value, assessing the viability of CIGS solar cells for low concentration applications.
Abstract:One of the most common strategies in high-efficiency crystalline silicon (c-Si) solar cells for the rear surface is the combination of a dielectric passivation with a point-like contact to the base. In such devices, the trade-off between surface passivation and ohmic losses determines the optimum distance between contacts or pitch. Given a certain pitch, the series resistance related to majority carrier flow through the base and the rear point-like contact (R base ) is commonly calculated a-priori and not crosschecked in finished devices, since typical techniques to measure series resistance lead to an unique value that includes all ohmic losses. In this work, we present a novel method to measure R base using impedance spectroscopy (IS) analysis. The IS data at high frequencies allow to determine R base due to the presence of the capacitor formed by the metal/dielectric/semiconductor structure that covers most of the rear surface. The method is validated by device simulations where the dependence of R base on carrier injection, base resistivity and pitch are reproduced. Finally, R base is measured on finished devices. As a result, a more accurate value of the contacted area is deduced which is a valuable information for further device optimization.
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