AbstractsThis work provides for the first time an experimental assessment of the impact of thermo-mechanically induced stresses by copper through-silicon vias, TSVs, on fully depleted Bulk FinFET devices. Both n and p type FinFETs are significantly affected by TSV proximity, exhibiting lower impact on drive current with respect to the planar devices. The obtained results are in agreement with the thermo-mechanical models for Cu-TSV and are supported by the 4 point bending stress calibration. Fig. 1: Cross sections of a through silicon via and a FinFET device at close proximity (a, b). The FinFET device has 40nm fin height, 20nm fin width, 1nm chemical oxide, followed by atomic layer deposition of 1.8nm HfO2 insulator and 5nm TiN work function metal gate (c,d)

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This work focuses on the analysis of recent developments and future trends of organic substrates and 2.5D interposers. In the sub 10 μm line/width space, substrate manufacturers are pushing towards traditionally foundry level Si processing dimensions. Latest R&D shows organic substrates with L/S capability down to 2/2 μm. Organic substrates and 2.5D interposers can be in many cases separated in two different groups, however certain solutions propose a combination of the two, such as embedded interposers or fine extension layers of organic substrates acting as interposers. These substrate and interposer architectural solutions are analyzed. Furthermore, organic processing options and latest feature sizes are discussed. Dielectric build up material options with low dielectric constant (Dk) and low tangent loss (Df) are analyzed and their expected thermo-mechanical property trends presented, including the coefficient of thermal expansion (CTE), Young's modulus (E) and glass transition temperature (Tg). Coreless substrates and their advantages, disadvantages, industry readiness and future development are also addressed. Furthermore, 2.5D interposer options are analyzed by type of material: Si, glass and organic. A qualitative and quantitative comparison of their features and market status is done and their future development is extrapolated. Final conclusions are made on the sub 10 μm line/width advanced substrate application space and the market interaction of organic substrates and 2.5D interposers