We developed a new type of wire-grid polarizer that has achieved excellent optical performance and reliability. The nanowire-grid polarizer is based on a fully optimized innovative design structure that consists of not only the core nanowire grid but also the surrounding multilayer thin-film structures. The surrounding structures are designed for antireflectivity to provide the best possible efficiency as well as for device reliability to provide the best possible handling robustness and environmental durability. The core nanowire grid utilizes nanosized high-aspect-ratio dielectric walls as a support for forming a high-aspect-ratio metal nanowire grid that significantly reduces energy loss as a result of metal absorption for the transmitted beam while providing a high extinction ratio of the blocked beam. The developed high-quality nanowire-grid polarizer has potential for use in many integrated optical applications.

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We developed various optical devices and integrated optical devices based on innovative nano-optical structures and design. The nano-optical devices and integrated devices were fabricated through a nanomanufacturing platform based on wafer level nano-replication with mold and nano-pattern transfer by nano-lithography. The nano-replication process, which based on imprinting a single-layer spin-coated UV curable resist, achieved excellent nano-patterning fidelity and on-wafer uniformity with high-throughput. Excellent wafer level performance and yield were achieved. Nano-optic devices, such as, quarter wave plates and polarizers, and integrated nano-optical devices, such as monolithically integrated semi-isolators, were manufactured with the nano-manufacturing platform. The developed technology is suitable for highthroughput and low cost manufacturing needs for commercializing nano-structure based optical devices and integrated optical devices.

We developed a nano-manufacturing platform based on wafer level nano-replication with mold and nanopattern transfer by nano-lithography. The nano-replication process, which based on imprinting a singlelayer spin-coated UV curable resist, achieved excellent nano-patterning fidelity and on-wafer uniformity with high-throughput. Nano-optic devices, such as, quarter wave plates and polarizers, were manufactured with the nano-manufacturing platform. Excellent wafer level performance and yield were achieved. The developed technology is suitable for high-throughput and low cost manufacturing needs for commercializing nano-structure based optical devices and integrated optical devices.