2005
DOI: 10.1109/jlt.2004.842298
|View full text |Cite
|
Sign up to set email alerts
|

Wafer-based nanostructure manufacturing for integrated nanooptic devices

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1

Citation Types

0
40
0

Year Published

2005
2005
2020
2020

Publication Types

Select...
7

Relationship

0
7

Authors

Journals

citations
Cited by 36 publications
(40 citation statements)
references
References 15 publications
0
40
0
Order By: Relevance
“…After this, a silicon nitride waveguide core layer of ϳ450 nm thickness was grown on by PECVD as well. A UV-nanoimprint lithography [14][15][16][17] was utilized to pattern the top subwavelength grating. A grating mold of 900 nm period was used in the UV-nanoimprint process.…”
Section: A Fabrication Of a Resonant Grating Filter Sensormentioning
confidence: 99%
“…After this, a silicon nitride waveguide core layer of ϳ450 nm thickness was grown on by PECVD as well. A UV-nanoimprint lithography [14][15][16][17] was utilized to pattern the top subwavelength grating. A grating mold of 900 nm period was used in the UV-nanoimprint process.…”
Section: A Fabrication Of a Resonant Grating Filter Sensormentioning
confidence: 99%
“…In the past three years, we have processed more than 1,000 4-inch-in-diameter wafers for nano-optic polarizers and waveplates by using the nanomanufacturing technology described in this paper, which is based on nanoreplication and nanolithography [28,30]. Statistically, we have achieved wafer throughput of 15 wafers (4 inches in diameter) per hour by means of nanoreplication.…”
Section: Wafer-based Optical Nanostructure Manufacturingmentioning
confidence: 99%
“…Park et al [13] provided a new silane chemistry route to improve antisticking properties of Ni stamps for nanoimprint lithography. Wang et al [14] presented a nanomanufacturing platform based on wafer-level nanoreplication with nanolithographic mold and nanopattern transfer. The surface of their mold was also treated with FDTS SAMs.…”
Section: Introductionmentioning
confidence: 99%