Innovative nano-optical devices and optical integration using nano-fabrication technologies

Abstract

We developed various optical devices and integrated optical devices based on innovative nano-optical structures and design. The nano-optical devices and integrated devices were fabricated through a nanomanufacturing platform based on wafer level nano-replication with mold and nano-pattern transfer by nano-lithography. The nano-replication process, which based on imprinting a single-layer spin-coated UV curable resist, achieved excellent nano-patterning fidelity and on-wafer uniformity with high-throughput. Excellent wafer level performance and yield were achieved. Nano-optic devices, such as, quarter wave plates and polarizers, and integrated nano-optical devices, such as monolithically integrated semi-isolators, were manufactured with the nano-manufacturing platform. The developed technology is suitable for highthroughput and low cost manufacturing needs for commercializing nano-structure based optical devices and integrated optical devices.

Integrated nano-optic devices based on immersion nano-gratings made by imprint lithography and nano-trench-filling technology

“…Previously [14], we have achieved a standalone visible quarter waveplate centered at a wavelength of 650 nm, based on a 200 nm period silicon nitride grating. Both a very high transmittance of > 98% and a very uniform phase retardation distribution of 90° ± 2° across a 100 mm in diameter wafer were achieved.…”

“…Although the form-birefringence concept based on sub-wavelength gratings has been demonstrated two decades' ago [12], it has not yet been successfully commercialized for real applications. In our previous work [13,14], we reported high-performance true-zero-order waveplates, both quarter waveplates and λ/31 retarders, based on nano-gratings.…”