We have measured electroluminescence (EL) spectra of GaAs/InGaAs and AlGaAs/GaAs single quantum well (QW) p-i-n photodiodes at temperatures between 200 and 300 K and forward biases close to the open circuit voltage. Integrated EL spectra vary like eqV/nkT with an ideality factor n=1.05±0.05 over five decades, indicating purely radiative processes. The spectra are calibrated into absolute units enabling comparison to be made with the predictions of a theoretical model. For each temperature and bias we calculate the EL spectrum and radiative current expected in the detailed balance limit, integrating the theoretical emission spectrum over the surface of the device, in order to establish the quasi-Fermi potential separation, Δφf, in the QW and, where possible, in the host material. For the GaAs/InGaAs cell we are able to model emission from the QW and the host material simultaneously. We find that, in all cases, the QW emission is overestimated by theory if it is assumed that Δφf=V. QW emission corresponds instead to a value of Δφf which a few tens of mV less than V. In contrast, emission from the host material, where visible, is well fitted by the model with Δφf=V at all biases and temperatures. We attribute the variation in Δφf to irreversible thermally assisted escape from the QWs.
The effect of the dislocation line density produced by the relaxation of strain in GaAs/In x Ga 1Ϫx As multiquantum wells where xϭ0.155-0.23 has been studied. There is a strong correlation between the dark line density, observed by cathodoluminescence, before processing of the wafers into photodiode devices, and the subsequent low forward bias ͑Ͻ1.5 V͒ dark current densities of the devices. A comparison is made of the correlation between the reverse bias current density and dark line density and it is found that, in this range of strain, the forward bias current density varies more. Two growth methods, molecular beam epitaxy and metal organic vapor phase epitaxy, have been used to produce the wafers and no difference between the growth methods has been found in dark line or current density variations with strain.
We report on characterization studies of high quality metal-organic vapor phase epitaxy and molecular beam epitaxy grown GaAs/InGaAs quantum wells, set within p-i-n diodes, to determine the well widths, indium mole fractions, and conduction band offset. We present photocurrent spectra containing a larger number of transitions than revealed in photoluminescence or photoluminescence excitation experiments. The energies of these transitions have been modeled using a theoretical characterization tool known as ‘‘contouring,’’ which is used in this strained system for the first time. This has enabled determination of the conduction band offset in GaAs/InGaAs quantum wells, to a value between 0.62 and 0.64, for a range of indium fractions between 0.155 and 0.23. As a final, additional check on our results, we compare the field dependence of the e1-hh1 exciton transition energy with our theoretical calculations and find good agreement.
Carrier escape from InP/AlGaAs single quantum well structures is studied by means of simultaneous steady state photocurrent and photoluminescence measurements. The activation energy for escape is measured for the first time in this system. The photoluminescence from the InGaAs wells indicates that a significant number of carriers do not escape at room temperature thus affecting the temperature dependence of the cell. An estimate of the nonradiative efficiency of the device studied is given as a function of bias and temperature. The relevance to new applications is discussed.
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