1996
DOI: 10.1063/1.363574
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Effect of strain relaxation on forward bias dark currents in GaAs/InGaAs multiquantum well pin diodes

Abstract: The effect of the dislocation line density produced by the relaxation of strain in GaAs/In x Ga 1Ϫx As multiquantum wells where xϭ0.155-0.23 has been studied. There is a strong correlation between the dark line density, observed by cathodoluminescence, before processing of the wafers into photodiode devices, and the subsequent low forward bias ͑Ͻ1.5 V͒ dark current densities of the devices. A comparison is made of the correlation between the reverse bias current density and dark line density and it is found th… Show more

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Cited by 45 publications
(23 citation statements)
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“…The results from this work are compared to those of Griffin et al [13] from the InGaAs/GaAs material system in Fig. 6.…”
Section: Comparison With Ingaas/gaasmentioning
confidence: 91%
See 1 more Smart Citation
“…The results from this work are compared to those of Griffin et al [13] from the InGaAs/GaAs material system in Fig. 6.…”
Section: Comparison With Ingaas/gaasmentioning
confidence: 91%
“…Even so, this data suggests that GaAsBi could be a suitable alternative to InGaAs for PV applications The calculations were performed using the method of Ref. [13]. The error bars were estimated from the range of Bi contents that produced a reasonable fit between the measured and modelled XRD scans.…”
Section: Comparison With Ingaas/gaasmentioning
confidence: 99%
“…This is why strain-balancing was shown before long to be a critical issue in developing efficient solar cells involving nanostructures such as quantum wells 10, 11 . Therefore, materials lattice-matched to GaAs/Ge and with a 1.0 eV or 1.15 eV bandgap are being extensively investigated.…”
Section: Introductionmentioning
confidence: 99%
“…В силу эффективной релаксации упругих напряжений вертикальное складирование большого числа рядов КТ может быть реализовано без возникновения дислока-ций. Квантовые ямы обладают значительно большим оптическим усилением/поглощением по сравнению с КТ, однако вследствие накопления упругих напряжений возможности их складирования ограничены [9].…”
Section: Introductionunclassified