1995
DOI: 10.1016/0022-3697(94)00146-4
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Structural, optical and electrical properties characterization of CdSbTe thin films grown by radiofrequency sputtering

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Cited by 8 publications
(2 citation statements)
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“…The slow rate of the growing process (4074 nm/h) could influence the amorphization of CdTe films. When we have used a deposition rate in the range 50-65 nm/h the CdTe films grow into polycrystalline structure with the grain size in the interval 40-65 nm [19,20]. Auger mass spectroscopy measurements, achieved employing an ESCA-SAM PHI-560 system, indicated (49.770.5)% Te and (50.370.5)% Cd as atomic concentrations.…”
Section: Methodsmentioning
confidence: 99%
See 1 more Smart Citation
“…The slow rate of the growing process (4074 nm/h) could influence the amorphization of CdTe films. When we have used a deposition rate in the range 50-65 nm/h the CdTe films grow into polycrystalline structure with the grain size in the interval 40-65 nm [19,20]. Auger mass spectroscopy measurements, achieved employing an ESCA-SAM PHI-560 system, indicated (49.770.5)% Te and (50.370.5)% Cd as atomic concentrations.…”
Section: Methodsmentioning
confidence: 99%
“…UV-vis absorption spectra measurements were performed in a Unicam 8700 spectrometer system over the 190-900 nm wavelength range. Energy band gap (E g ) measurements were carried out by means of optical absorption spectra by using the Tauc's formula for amorphous semiconductors: (ahn)p(hnÀE g ) m [10][11][12][13][14][15][16][17][18][19][20][21], where a is the absorption coefficient, h is the Planck's constant, n is the frequency of the light, and the exponent m takes the values 1 2 and 2 for allowed direct and indirect transitions [10][11][12][13][14][15][16][17][18][19][20][21]. Actually, as the absorption coefficient is proportional to the optical density (O.D.…”
Section: Methodsmentioning
confidence: 99%