2016
DOI: 10.1007/s10825-016-0830-5
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Optimization of saddle junctionless FETs for extreme high integration

Abstract: In this work, a saddle junctionless field effect transistors with optimal gate structure is proposed for extreme high integration. The forward and reverse I-V characteristics of the optimal saddle JL FETs have been extensively investigated by analyzing the influence of doping concentration, the height of the source/drain extension region and the gate structure engineering from physical insight. Design optimization has also been performed and the optimal parameters have been proposed.

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Cited by 5 publications
(2 citation statements)
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“…The shorter channel is less immune to the SCEs, and the distance between gate and source/drain contact is decreased, which triggers the prominent leakage current. In our previous work, we proposed novel saddle JL FETs which need no additional chip area to be occupied (or in other words, the integration can be maintained with the same level as double‐gate or triple‐gate JL FETs) but realize more excellent performance comparing with conventional double‐gate or triple‐gate JL FETs . The novel structure has another 2 vertical channels which increase the effective channel length without occupying additional chip area, so the distance between the source and drain electrode is lengthened, which weakens the effects mentioned above.…”
Section: Introductionmentioning
confidence: 99%
“…The shorter channel is less immune to the SCEs, and the distance between gate and source/drain contact is decreased, which triggers the prominent leakage current. In our previous work, we proposed novel saddle JL FETs which need no additional chip area to be occupied (or in other words, the integration can be maintained with the same level as double‐gate or triple‐gate JL FETs) but realize more excellent performance comparing with conventional double‐gate or triple‐gate JL FETs . The novel structure has another 2 vertical channels which increase the effective channel length without occupying additional chip area, so the distance between the source and drain electrode is lengthened, which weakens the effects mentioned above.…”
Section: Introductionmentioning
confidence: 99%
“…Mohammad Bavir et al studied the performance of a JLDG (Double gate) MOSFET with and without symmetrical side gates. 39 The schematic structure is being represented in Fig. 3.…”
mentioning
confidence: 99%