2017
DOI: 10.1016/j.egypro.2017.09.272
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Effective passivation of crystalline silicon surfaces by ultrathin atomic-layer-deposited TiOx layers

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Cited by 28 publications
(17 citation statements)
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“…However, additional Na has a considerable effect on V oc , and it is not always easy to reveal the effect of passivation layer alone. Nevertheless, there are still a lot of approaches that need optimization like using very thin passivation layers to allow tunneling or using different oxides, such as TiO x , HfO x , etc., as a passivation layer [31,32]. Furthermore, passivation layers combined with light management techniques, like using Ag NP metallic mirrors below the passivation layers, require some improvements.…”
Section: Discussionmentioning
confidence: 99%
“…However, additional Na has a considerable effect on V oc , and it is not always easy to reveal the effect of passivation layer alone. Nevertheless, there are still a lot of approaches that need optimization like using very thin passivation layers to allow tunneling or using different oxides, such as TiO x , HfO x , etc., as a passivation layer [31,32]. Furthermore, passivation layers combined with light management techniques, like using Ag NP metallic mirrors below the passivation layers, require some improvements.…”
Section: Discussionmentioning
confidence: 99%
“…However, this choice has two main drawbacks: (i) the surface of nanoPS is rapidly oxidized upon exposition to the atmosphere, leading to changes in its optical properties [16], and (b) two main recombination mechanisms can take place on the surface of nanoPS, namely radiative recombination through surface states (surface recombination) and through oxygen vacancies [17]. In this line, thin layers of In2O3 [16], SiO2 or SiO2/SiN [18], TiO2 [19] and Al2O3 or Al2O3/SiN have been used to passivate the surface of nanoPS [20]. Thin layers with high resistivity or even insulating nature in contact with the active layer of solar cells limit the amount of current that can flow into a small localized area, thus lowering the carrier mobility which improves cell efficiency as a result of an increase in the open-circuit voltage [21].…”
Section: Introductionmentioning
confidence: 99%
“…High passivation performance and efficient carrier collection are prerequisites to achieving high PCE. The passivation performance of the TiO x has been improved by post‐deposition annealing, [ 12–17 ] inserting silicon oxide interlayer, [ 12–17 ] and hydrogen plasma treatment. [ 11,18–20 ] The origin of the improved passivation performance is plausibly caused by the formation of SiOTi bonds, [ 16,21,22 ] hydrogenation of dangling bonds on the Si surface, [ 11,18–20 ] and enhanced band bending by trapped electrons in TiO x .…”
Section: Introductionmentioning
confidence: 99%