Advances in ion beam sputtered Sc 2 O 3 for optical interference coatings

Menoni, Carmen S.; Krous, E.; Patel, D.; Langston, Peter; Tollerud, Jonathan O.; Nguyễn, Duc Tung; Emmert, Luke A.; Markosyan, A. S.; Route, R.; Fejer, M. M.; Rudolph, Wolfgang

doi:10.1117/12.855604

Cited by 17 publications

(13 citation statements)

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“…5 fractions show greater oxidation ratios than expected from the molecular compositions. This result is in accordance with the stoichiometric ratios (O/Sc) of 1.73-1.76 published in [12] for pure scandia thin films. The microstructure of the mixture coatings is investigated by XRD employing Cu Kα radiation (0.154 nm) at a grazing angle of 0.6°.…”

Section: Refractive Indexsupporting

confidence: 92%

“…In a few studies on the optical and physical properties of single layers [7][8][9] or for applications in the UV wavelength range [10,11] evaporated scandia coatings have been analyzed. The optical properties and the femtosecond laser damage thresholds of pure scandia single layers deposited by ion beam sputtering (IBS) are discussed in [12].…”

Section: Introductionmentioning

confidence: 99%

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Laser damage resistance of ion-beam sputtered Sc₂O₃/SiO₂ mixture optical coatings

et al. 2013

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We report on the correlation between the laser damage resistance, the optical and the physical properties of Sc(2)O(3)/SiO(2) mixture coatings. Several sets of samples with ten different mixture ratios have been prepared by ion-beam sputtering. The atomic compositions of the mixture thin films are quantified employing x-ray photoelectron spectroscopy depth profiles. Laser-induced damage thresholds are determined with single subpicosecond pulses (500 fs) at 1030 nm. Furthermore, Son1 multishot measurements are realized in the ultraviolet wavelength range (355 nm) at pulse durations of 5 ns. In addition, the influence of two different substrate polishing qualities on the radiation resistance of the composite thin films is discussed.

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Section: Refractive Indexsupporting

confidence: 92%

Section: Introductionmentioning

confidence: 99%

Laser damage resistance of ion-beam sputtered Sc₂O₃/SiO₂ mixture optical coatings

et al. 2013

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“…18,22 • For SiO 2 , there is a continous decrease of the LIDT with the number of applied pulses and it was not possible to observe a stabilization threshold with the maximum of pulses that we have applied. So it is not possible to compare the stabilization threshold for these two wavelengths.…”

Section: Wavelength Dependence Of Laser-induced Damage Thresholdmentioning

confidence: 85%

Laser-induced damage of optical thin films submitted to 343, 515, and 1030 nm multiple subpicosecond pulses

2014

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Laser-induced damage of optical thin films submitted to 343, 515, and 1030 nm multiple subpicosecond pulses Dam-Bé Douti Laurent Gallais Mireille Commandré Downloaded From: http://opticalengineering.spiedigitallibrary.org/ on 05/15/2015 Terms of Use: http://spiedl.org/termsLaser-induced damage of optical thin films submitted to 343, 515, and 1030 nm multiple subpicosecond pulses Abstract. Optical materials submitted to multiple subpicosecond irradiations are known to exhibit a decrease of the laser-induced damage threshold (LIDT) with the applied number of pulses, an effect referred to as "fatigue" or "incubation." In this work, we experimentally investigate this effect for the case of optical thin films submitted to multiple exposures with 500 fs pulses at different wavelengths: 1030, 515, and 343 nm. Niobia, hafnia, and silica films made with dense coating techniques (magnetron sputtering, ion-assisted deposition, and reactive low voltage ion plating) are studied, as well as the surface of a fused silica substrate. These samples have been exposed to different pulse numbers (from 1 to 100,000) at a low-frequency repetition rate (less than 1 kHz) and the LIDT has been measured. The results reveal the differences between materials and for the various wavelengths such as the decrease rate of the LIDT or the stabilization level that is reached after multiple exposures. All the results evidence the role of native-and laser-induced defects that we discuss on the basis of published works on the subject. Downloaded From: http://opticalengineering.spiedigitallibrary.org/ on 05/15/2015 Terms of Use: http://spiedl.org/terms

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“…The stoichiometry in the films varied from 1.72 to 1.84 for beam voltages of 600-1000 V, respectively. Instead, in the Sc 2 O 3 films deposited using different oxygen partial pressures, the stoichiometry varied from 1.84 to 2.05, showing excess O 2 in the films [6]. Figure 3 illustrates the characteristics of the EPR spectra from samples deposited using different oxygen partial pressures.…”

Section: Resultsmentioning

confidence: 99%

“…In contrast to a recent report by Mende et al [5], we employ a Sc metal target to deposit the Sc 2 O 3 oxide film [6,7]. Among the advantages of using metal targets is the ability to tailor process parameters such as oxygen partial pressure and ion beam energy.…”

Section: Introductionmentioning

confidence: 99%

Point defects in Sc₂O₃ thin films by ion beam sputtering

et al. 2014

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We show that the concentration of oxygen interstitials trapped in Sc2O3 films by ion beam sputtering from metal targets can be controlled by modifying deposition conditions. We have identified point defects in the form of oxygen interstitials that are present in Sc2O3 films, in significantly high concentrations, i.e., ∼10(18) cm(-3). These results show a correlation between the increase of oxygen interstitials and the increase in stress and optical absorption in the films. Sc2O3 films with the lowest stress and optical absorption loss at 1 μm wavelength were obtained when using a low oxygen partial pressure and low beam voltage.

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Advances in ion beam sputtered Sc 2 O 3 for optical interference coatings

Cited by 17 publications

References 0 publications

Laser damage resistance of ion-beam sputtered Sc₂O₃/SiO₂ mixture optical coatings

Laser damage resistance of ion-beam sputtered Sc₂O₃/SiO₂ mixture optical coatings

Laser-induced damage of optical thin films submitted to 343, 515, and 1030 nm multiple subpicosecond pulses

Point defects in Sc₂O₃ thin films by ion beam sputtering

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Advances in ion beam sputtered Sc 2 O 3 for optical interference coatings

Cited by 17 publications

References 0 publications

Laser damage resistance of ion-beam sputtered Sc2O3/SiO2 mixture optical coatings

Laser damage resistance of ion-beam sputtered Sc2O3/SiO2 mixture optical coatings

Laser-induced damage of optical thin films submitted to 343, 515, and 1030 nm multiple subpicosecond pulses

Point defects in Sc2O3 thin films by ion beam sputtering

Contact Info

Product

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Laser damage resistance of ion-beam sputtered Sc₂O₃/SiO₂ mixture optical coatings

Laser damage resistance of ion-beam sputtered Sc₂O₃/SiO₂ mixture optical coatings

Point defects in Sc₂O₃ thin films by ion beam sputtering