A quasimodal expansion method (QMEM) is developed to model and understand the scattering properties of arbitrary shaped two-dimensional (2-D) open structures. In contrast with the bounded case which have only discrete spectrum (real in the lossless media case), open resonators show a continuous spectrum composed of radiation modes and may also be characterized by resonances associated to complex eigenvalues (quasimodes). The use of a complex change of coordinates to build Perfectly Matched Layers (PMLs) allows the numerical computation of those quasimodes and of approximate radiation modes. Unfortunately, the transformed operator at stake is no longer self-adjoint, and classical modal expansion fails. To cope with this issue, we consider an adjoint eigenvalue problem which eigenvectors are bi-orthogonal to the eigenvectors of the initial problem. The scattered field is expanded on this complete set of modes leading to a reduced order model of the initial problem. The different contributions of the eigenmodes to the scattered field unambiguously appears through the modal coefficients, allowing us to analyze how a given mode is excited when changing incidence parameters. This gives new physical insights to the spectral properties of different open structures such as nanoparticles and diffraction gratings. Moreover, the QMEM proves to be extremely efficient for the computation of Local Density Of States (LDOS).

We report on extensive femtosecond laser damage threshold measurements of optical materials in both bulk and thin-film form. This study, which is based on published and new data, involved simple oxide and fluoride films, composite films made from a mixture of two dielectric materials, metallic films, and the surfaces of various bulk materials: oxides, fluorides, semiconductors, and ionic crystals. The samples were tested in comparable conditions at 1030 nm, 375 to 600 fs, under single-pulse irradiation. A large number of different samples prepared by different deposition techniques have been tested, involving classical materials used in the fabrication of optical thin film components (Ag, AlF3, Al2O3, HfO2, MgF2, Nb2O5, Pt, Sc2O3, SiO2, Ta2O5, Y2O3, and ZrO2) and their combination with codeposition processes. Their behaviors are compared with the surfaces of bulk materials (Al2O3, BaF2, CaF2, Ge, KBr, LiF, MgF2, NaCl, Quartz, Si, ZnS, ZnSe, and different silica glasses). Tabulated values of results are presented and discussed.

International audienceAn experimental and numerical study of the laser-induced damage of the surface of optical materialin the femtosecond regime is presented. The objective of this work is to investigate the differentprocesses involved as a function of the ratio of photon to bandgap energies and compare the resultsto models based on nonlinear ionization processes. Experimentally, the laser-induced damagethreshold of optical materials has been studied in a range of wavelengths from 1030 nm (1.2 eV) to310 nm (4 eV) with pulse durations of 100 fs with the use of an optical parametric amplifier system.Semi-conductors and dielectrics materials, in bulk or thin film forms, in a range of bandgap from 1to 10 eV have been tested in order to investigate the scaling of the femtosecond laser damagethreshold with the bandgap and photon energy. A model based on the Keldysh photo-ionizationtheory and the description of impact ionization by a multiple-rate-equation system is used toexplain the dependence of laser-breakdown with the photon energy. The calculated damage fluencethreshold is found to be consistent with experimental results. From these results, the relativeimportance of the ionization processes can be derived depending on material properties and irradiationconditions. Moreover, the observed damage morphologies can be described within the frameworkof the model by taking into account the dynamics of energy deposition with one dimensionalpropagation simulations in the excited material and thermodynamical considerations

We report on the laser damage resistance of ion beam-sputtered oxide materials (Al2O3, Nb2O5, HfO2, SiO2, Ta2O5, ZrO2) and mixtures of Al2O3-SiO2, Nb2O5-SiO2, HfO2-SiO2, Ta2O5-SiO2, and ZrO2-SiO2, irradiated by single 500 fs pulses at 1030 nm. Laser-induced damage threshold (LIDT), refractive index, and bandgaps of the single-layer coatings are measured. For pure oxide materials a linear evolution of the LIDT with bandgap is observed. The results are in accordance with our simulations based on photo-ionization and avalanche-ionization. In the case of mixtures, however, deviations from the previous behaviors are evidenced. The evolution of the LIDT as a function of the refractive index is analyzed, and an empirical description of the relation between refractive index and LIDT is proposed.

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An overview of photothermal deflection principles and applications is given. The modeling of temperature distribution and the calculation of deflection that is due to both the refractive-index gradient and the thermal deformation of the sample are presented. Three configurations usually employed are compared, and their respective advantages are discussed in relation to their application. The calibration for absolute measurement of absorption is detailed, showing that calibration limits the accuracy of measurement. Some examples of specific information obtained by photothermal mapping of absorption are given.

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