2009
DOI: 10.1590/s0103-97332009000500006
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Annealing time effect on the properties of CuInSe2 grown by electrodeposition using two electrodes system

Abstract: In this paper, we report the effect of annealing time on the properties of copper indium diselenide CuInSe 2 films. The CuInSe 2 thin films have been grown at room temperature by electrochemical deposition technique using two electrodes system. The as deposited films were annealed under argon atmosphere at 300 o C during 15, 30, 45 and 60 min. The structural and morphological properties of the resulting films were characterized respectively by means of x-ray diffraction (XRD) and scanning electron microscopy (… Show more

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Cited by 14 publications
(2 citation statements)
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“…The d( 112) increased rapidly at annealing temperatures ≥ 300°C. The better crystallinity was obtained by a decrease in the number of crystallographic-rearrangement-induced structural defects and internal stresses [23]. This is in agreement with the grain sizes of the RTA-treated CIS thin films in the inset in Fig.…”
Section: Resultssupporting
confidence: 87%
“…The d( 112) increased rapidly at annealing temperatures ≥ 300°C. The better crystallinity was obtained by a decrease in the number of crystallographic-rearrangement-induced structural defects and internal stresses [23]. This is in agreement with the grain sizes of the RTA-treated CIS thin films in the inset in Fig.…”
Section: Resultssupporting
confidence: 87%
“…The characteristic diffraction peaks for full series of CIS can be designated corresponding to plane (112), (103), (204/220), (116/312), (400) and (316/332) according to JCPDS 23-209 [21]. In addition, peaks of other impurities such as Se JCPDS 24-714 [22] and CuSe JCPDS 49-1456 [23] have been also detected. XRD spectra show a weak peak in first two low temperature synthesized CIS-1 and CIS-2.…”
Section: Structural Analysismentioning
confidence: 99%