2000
DOI: 10.1590/s0103-97332000000200019
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Space-charge-limited conduction in thin film Al/Sb2Pb1Se7/Al devices

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Cited by 12 publications
(7 citation statements)
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“…If there exist deep traps at the M/S interface, the charge conduction profile is modified and these modifications affect the slopes of the forward bias I-V characteristics. At low voltages (I. regime), the current-transport mechanism for the sample exhibits an ohmic behavior, that is, the current is directly proportional to applied bias voltage [10,[45][46][47]. This behavior can be attributed to the superior- ity of bulk generated current in the film to the injected free carrier generated current [47][48][49].…”
Section: T (K)mentioning
confidence: 99%
“…If there exist deep traps at the M/S interface, the charge conduction profile is modified and these modifications affect the slopes of the forward bias I-V characteristics. At low voltages (I. regime), the current-transport mechanism for the sample exhibits an ohmic behavior, that is, the current is directly proportional to applied bias voltage [10,[45][46][47]. This behavior can be attributed to the superior- ity of bulk generated current in the film to the injected free carrier generated current [47][48][49].…”
Section: T (K)mentioning
confidence: 99%
“…In the high-bias region, the structure approaches the trap-filled limit; consequently, the slope tends to decrease. The intense electron injection causes electrons to escape from the traps, thereby contributing to the generation of space-charge-limited current (SCLC). …”
Section: Resultsmentioning
confidence: 99%
“…Here, m represents the slope of the each regions' linear section and was found as 1.60, 4.35 and 1.73 for Au/n-Si structure with anatase phase TiO 2 and 1.89, 11.70 and 2.02 for Au/n-Si structure with rutile phase TiO 2 , respectively. At low bias region (region 1), the current conduction mechanism for both of the samples exhibits an ohmic behavior, that is, the current is directly proportional to applied bias voltage [45]. This behavior can be attributed to the superiority of bulkgenerated current in the film to the injected free carrier generated current [45][46][47].…”
Section: Resultsmentioning
confidence: 99%
“…At low bias region (region 1), the current conduction mechanism for both of the samples exhibits an ohmic behavior, that is, the current is directly proportional to applied bias voltage [45]. This behavior can be attributed to the superiority of bulkgenerated current in the film to the injected free carrier generated current [45][46][47]. The second region for the both samples can be characterized by power law dependence.…”
Section: Resultsmentioning
confidence: 99%
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