Articles you may be interested inPattern dependency in selective epitaxy of B-doped SiGe layers for advanced metal oxide semiconductor field effect transistors Scaling the SiGe channel p metal-oxide-semiconductor field effect transistor: The case for p+ SiGe gates A low temperature gate oxide process for n -channel SiGe modulation doped field effect transistors A self-aligned process used to fabricate p-type SiGe metal-oxide-semiconductor modulation-doped field effect transistors ͑MOS-MODFET͒ is described. Self-and nonself-aligned p-type Si 0.2 Ge 0.8 /Si 0.7 Ge 0.3 MOS-MODFETs with gate-lengths from 1 m down to 100 nm were fabricated. The dc and microwave characteristics of these devices are presented. In comparison with nonself-aligned devices, self-aligned devices exhibited higher extrinsic transconductances, lower threshold voltages, higher unity current gain cutoff frequencies f T , and maximum oscillation frequencies f MAX . Self-aligned MOS-MODFETs with a gate length of 100 nm exhibited an extrinsic transconductance of 320 mS/mm, an f T of 64 GHz, and an f MAX of 77 GHz. To our knowledge, these are the highest data ever reported for any MOS-type p-FETs with a SiGe channel. All these excellent performances were measured at very low drain and gate biases.
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