2000
DOI: 10.4028/www.scientific.net/msf.338-342.1311
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Highly Durable SiC nMISFET's at 450°C

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“…It is a rapidly expanding field of research. Oxide/nitride/oxide stacks and also oxides subjected to nitridation have been shown to have improved dielectric strength [41,42] however oxide is still a base of this gate dielectric system determining interface properties. Also monocrystalline AlN was suggested and tried [43,44] but its deposition or MBE growth requires high temperatures (> 1000 • C).…”
Section: Current Handling Capabilitymentioning
confidence: 99%
“…It is a rapidly expanding field of research. Oxide/nitride/oxide stacks and also oxides subjected to nitridation have been shown to have improved dielectric strength [41,42] however oxide is still a base of this gate dielectric system determining interface properties. Also monocrystalline AlN was suggested and tried [43,44] but its deposition or MBE growth requires high temperatures (> 1000 • C).…”
Section: Current Handling Capabilitymentioning
confidence: 99%