Plasmonics is a fast developing research area with a great potential for practical applications. However, the implementation of plasmonic devices requires low cost methodologies for the fabrication of organized metallic nanostructures that covers a relative large area (∼1 cm2). Here the patterning of periodic arrays of nanoholes (PANHs) in gold films by using a combination of interference lithography, metal deposition, and lift off is reported. The setup allows the fabrication of periodic nanostructures with hole diameters ranging from 110 to 1000 nm, for 450 and 1800 nm of periodicity, respectively. The large areas plasmonic substrates consist of 2 cm × 2 cm gold films homogeneously covered by nanoholes and gold films patterned with a regular microarray of 200 μm diameter circular patches of PANHs. The microarray format is used for surface plasmon resonance (SPR) imaging and its potential for applications in multiplex biosensing is demonstrated. The gold films homogeneously covered by nanoholes are useful as electrodes in a thin layer organic photovoltaic. This is first example of a large area plasmonic solar cell with organized nanostructures. The fabrication approach reported here is a good candidate for the industrial‐scale production of metallic substrates for plasmonic applications in photovoltaics and biosensing.

Two-dimensional hexagonal photonic crystals can be recorded using the simple superimposition of two interference patterns rotated by 60 masculine. Such process generates high contrast masks, however, it generates elliptical cross section structures instead of cylinders. We study the PBG properties of the experimentally feasible geometries, using this technique and we demonstrate that the effect of this asymmetric shape is a reduction in the PBG map area, for TE polarization, in comparison with cylindrical structures. On the other hand, it appears a PBG for TM polarization.

Several fabrication techniques are recently used to produce a nanopattern for sensing, as focused ion beam milling (FIB), e-beam lithography (EBL), nanoimprinting, and soft lithography. Here, interference lithography is explored for the fabrication of large area nanohole arrays in metal films as an efficient, flexible, and scalable production method. The transmission spectra in air of the 1 cm2 substrate were evaluated to study the substrate behavior when hole-size, periodicity, and film thickness are varied, in order to elucidate the best sample for the most effective sensing performance. The efficiency of the nanohole array was tested for bulk sensing and compared with other platforms found in the literature. The sensitivity of ~1000 nm/RIU, achieved with an array periodicity in the visible range, exceeds near infrared (NIR) performances previously reported, and demonstrates that interference lithography is one of the best alternative to other expensive and time-consuming nanofabrication methods.

Plasmonic biosensors, particularly arrays of nanoholes on thin gold films, have been widely explored in recent years as possible platforms for fast medical diagnostic. In this work, we present a screening method for leukemia cancer markers that uses a plasmonic biosensor based on nanohole arrays fabricated on plastic substrates. The low-cost, scalable, and reproducible nanohole array structures were fabricated by UV nanoimprinting technique. The relative concentration of human immunoglobulin kappa and lambda light chains in blood serum was employed as a screening method. The kappa/lambda concentration ratio was used to determine an unbalance in the immunoglobulin production due to leukemia. The platform was tested using serum samples from patients with known leukemia diagnoses. The results indicated that this inexpensive and flexible plasmonic platform is a promising tool for routine screening in clinical settings.

2D hexagonal patterns can be generated by the superimposition of two or three fringe patterns that have been formed by two-wave interference and that have rotations of 60 degrees between them. Superimposing three exposures solves the problem of asymmetry in the cross section of structures, which is caused by double exposure. The resulting structure, however, depends on the phase shift of the third fringe pattern in relation to the previous two. We propose a method for controlling the phase shift, and we demonstrate that three different lattice geometries of hexagonal photonic crystals can be recorded when the phase is chosen.

Articles you may be interested inPotassium hydroxide polishing of nanoscale deep reactive-ion etched ultrahigh aspect ratio gratings Formation of three-dimensional and nanowall structures on silicon using a hydrogen-assisted high aspect ratio etching J.Maximum achievable aspect ratio in deep reactive ion etching of silicon due to aspect ratio dependent transport and the microloading effect Bosch type processes have been employed to fabricate nanostructured Si surfaces. Nanopillars and nanocones in Si have been fabricated using different techniques for Ni micromasking. Plasma redeposition of Ni was found to be responsible for Si pillar formation with diameters varying in the submicron range. A possibility to produce tilted nanopillars with tilt angles up to as high as 25°has been demonstrated. In other method, previously deposited and annealed thin Ni films were employed. Smaller Ni nanoislands were obtained, and the formation of Si nanocones was demonstrated using longer passivation steps. In this case, reflection coefficients as low as 1.2% were obtained for the optimized etching process time.

An experimental investigation on how the bulk and surface sensitivities of gold nanohole arrays fabricated by interference lithography affect the degree of white light beam collimation is presented. The optical transmission response of nanohole arrays has been recorded by focused and collimated beam transmission spectra. The results show that both the bulk and surface sensitivities for the collimated case are much larger than for the focused case. In particular, the shape of the spectra was dependent on the degree of beam collimation. The results showed that improved sensing performance (around 3.5 times) and higher figure of merit (around 4.4 times) can be obtained by simply adjusting the incident/collection experimental conditions in transmission measurements.

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