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Articles you may be interested inPotassium hydroxide polishing of nanoscale deep reactive-ion etched ultrahigh aspect ratio gratings Formation of three-dimensional and nanowall structures on silicon using a hydrogen-assisted high aspect ratio etching J.Maximum achievable aspect ratio in deep reactive ion etching of silicon due to aspect ratio dependent transport and the microloading effect Bosch type processes have been employed to fabricate nanostructured Si surfaces. Nanopillars and nanocones in Si have been fabricated using different techniques for Ni micromasking. Plasma redeposition of Ni was found to be responsible for Si pillar formation with diameters varying in the submicron range. A possibility to produce tilted nanopillars with tilt angles up to as high as 25°has been demonstrated. In other method, previously deposited and annealed thin Ni films were employed. Smaller Ni nanoislands were obtained, and the formation of Si nanocones was demonstrated using longer passivation steps. In this case, reflection coefficients as low as 1.2% were obtained for the optimized etching process time.

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This study aims to conduct a systematic review of the literature through bibliometrics and content analysis to raise barriers, data agenda, and a framework to support academics and practitioners of fractional calculus in transport phenomena from the perspectives of food engineering. The structure of the methodological procedure is a selection of studies in the research area, statistical analysis of the data, and content analysis. The Bibliometrix package of software R was used in the bibliometric analysis, being fundamental for the organization of the discussions. Finally, the food engineering area researchers can use the questions, barriers, and research agenda in fractional calculus to solve problems in the studied clusters' processes. Based on the previous knowledge of the researcher, a path was provided to follow the data agenda and the proposed framework, identify insights, and solve a specific problem. As the main contribution, this study presents several applications and the most significant barriers and presents bibliometrics quantifying the theoretical and empirical studies in the area. Nonetheless, this study places the research field of fractional calculus for Food Engineering, Science, and Technology, presenting several applications and the most significant barriers quantifying the theoretical and empirical studies in the area. As a practical contribution, this study presents a research agenda and a framework that can contribute to practitioners applying fractional calculus in process control.

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Ni-P, Ni-B and SiO2 films were used as hard mask materials in Si etching using a high-density inductively coupled plasma (ICP) reactor for MEMS fabrication. The Ni-P and Ni-B films were deposited using an electroless method, and the SiO2 film was thermally grown in a conventional furnace. Two etching processes were used to characterize the masks. The first uses SF6/Ar gas mixture varying bias power and process time, and the second is a Bosch like process, using C4F8 as a passivation gas. The Ni-P mask showed the highest resistance to etching, being applicable in Si deep etching (>100m); while the SiO2 mask was found to be less resistive, especially under strong ion bombardment (high bias power). The Ni-B mask was found to be highly porous, resulting in formation of micropillars during ecthing, which may be interesting for some apllications such as sensors.

This paper proposes a novel jerk circuit obtained by using an alternative nonlinear bipole component of inductor and diode in parallel. The circuit is described by five differential equations and investigated by the stability analysis, equilibria points, Kaplan–Yorke dimension, phase portraits, Lyapunov characteristic exponent estimation, bifurcation diagram and the 0–1 test chaos detection. The control parameter is adopted by varying the inductor [Formula: see text] value, this system can display periodic orbit, quasi-periodic orbit and chaotic behavior. The dynamic influence of transit diode capacitance is done and this confirms the robustness of the system to noise influence. The validity of the numerical simulations is experimentally realized through the phase portraits of the circuit. Finally, the synchronization of the systems is studied and time simulation results are presented.