The ability to measure step height and to calibrate step height artefacts is of vital interest in nanometrology. On that score the WGDM7 decided in 1998 to include measurements of step heights in a series of comparisons on the field of nanometrology.The comparison about step height (NANO2) started in September 2000 with the Physikalisch-Technische Bundesanstalt (PTB) as pilot laboratory. Fourteen national metrology institutes worldwide participated in this comparison. A set of five step height standards in the range from 7 nm to 800 nm was used for the comparison. The lateral size of the structures of the step height standards was chosen so that the height could be measured by different types of instruments, for example, interference microscopes, stylus instruments and scanning probe microscopes (SPM). The reference values were calculated as the weighted mean of all measurements that fulfilled the En < 1 criteria.Most of the results were in good agreement with the reference values. It is noticeable that the results obtained by different types of instruments are quite compatible. Also this comparison is the first comprehensive test of the reliability of SPM and their suitability for traceable measurements of step heights. Further it was shown that today step heights on samples can be measured with uncertainties in the sub-nanometre range. Differences in the calculation of the uncertainty depend on the types of instruments and on the users. For each class of instrument, e.g. SPM, it would be meaningful to homogenise these models. Hence the results of this comparison are of great importance in many respects.Main text. To reach the main text of this paper, click on Final Report. Note that this text is that which appears in Appendix B of the BIPM key comparison database kcdb.bipm.org/.The final report has been peer-reviewed and approved for publication by the CCL, according to the provisions of the Mutual Recognition Arrangement (MRA).
The only difference between nanotechnology and many other fields of science or engineering is that of size. Control in manufacturing at the nanometre scale still requires accurate and traceable measurements whether one is attempting to machine optical quality glass or write one's company name in single atoms. A number of instruments have been developed at the National Physical Laboratory that address the measurement requirements of the nanotechnology community and provide traceability to the definition of the metre. The instruments discussed in this paper are an atomic force microscope and a surface texture measuring instrument with traceable metrology in all their operational axes, a combined optical and x-ray interferometer system that can be used to calibrate displacement transducers to subnanometre accuracy and a co-ordinate measuring machine with a working volume of (50 mm)3 and 50 nm volumetric accuracy.
It is now fully appreciated that metrology will play an integral role in the successful development and commercialization of micro- and nanotechnology. To this end, the UK Government, through the National Measurement System, funded several groundbreaking projects in its 2002–2005 Programme for Length. This paper will briefly describe the background of the research, concentrating on the technical details of the projects. The Programme for Length normally only funds work into dimensional metrology but this funding cycle also funded work into low force metrology as this area is crucial to most mechanical probing techniques. The projects described include a traceable areal contacting instrument designed to calibrate areal transfer artefacts and hence offer traceability for industrial areal instruments, the production of the areal transfer artefacts, the development of Internet-based softgauges for profile parameters, a primary low force balance with a force resolution of 50 pN and the development of methods for measuring complex micro-scale structures. Amongst others, the projects involved collaboration with PTB, TNO, Taylor Hobson, AWE, Rubert & Co. and the Universities of Warwick, Huddersfield and Eindhoven.
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