Traceable calibration of transfer standards for scanning probe microscopy

Haycocks, J; Jackson, Keith

doi:10.1016/j.precisioneng.2004.06.002

Cited by 68 publications

(52 citation statements)

References 9 publications

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“…Generally, we can start from the detailed uncertainty budgets for metrological SPMs presented in [21,22] and take into account the effects of tip radius and geometry as described elsewhere [23]. In addition to conventional uncertainty components there are also various effects related to the high-speed measurement and developed data processing.…”

Section: Uncertainty Analysismentioning

confidence: 99%

Large area high-speed metrology SPM system

et al. 2015

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We present a large area high-speed measuring system capable of rapidly generating nanometre resolution scanning probe microscopy data over mm2 regions. The system combines a slow moving but accurate large area XYZ scanner with a very fast but less accurate small area XY scanner. This arrangement enables very large areas to be scanned by stitching together the small, rapidly acquired, images from the fast XY scanner while simultaneously moving the slow XYZ scanner across the region of interest. In order to successfully merge the image sequences together two software approaches for calibrating the data from the fast scanner are described. The first utilizes the low uncertainty interferometric sensors of the XYZ scanner while the second implements a genetic algorithm with multiple parameter fitting during the data merging step of the image stitching process. The basic uncertainty components related to these high-speed measurements are also discussed. Both techniques are shown to successfully enable high-resolution, large area images to be generated at least an order of magnitude faster than with a conventional atomic force microscope.

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Section: Uncertainty Analysismentioning

confidence: 99%

Large area high-speed metrology SPM system

et al. 2015

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“…Scanning over an area below approximately (1 × 1) mm can be done with PZT-driven flexture stages with virtually no backlash, and sensitivity and resolution on the nm level or better [7,8]. The design of the stage relies on flexible joints and suffers moderately from the presence of guidance errors over the scanning range.…”

Section: Conceptsmentioning

confidence: 99%

Six-axis interferometric coordinates measurement system for nanometrology

et al. 2014

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We present an overview of approaches to the design of nanometrology coordinates measuring setup with a focus on methodology of nanometrology interferometric techniques and associated problems. The design and development of a nanopositioning system with interferometric multiaxis monitoring and control involved for scanning probe microscopy techniques (primarily atomic force microscopy, AFM) for detection of the sample profile is presented. Coordinate position sensing allows upgrading the imaging microscope techniques up to quantified measuring. Especially imaging techniques in the micro-and nanoworld overcoming the barrier of resolution given by the wavelength of visible light are a suitable basis for design of measuring systems with the best resolution possible. The practical measurement results of active compensation system for positioning angle errors suppression are presented as well as the analysis of overall achievable parameters. The system is being developed in cooperation with the Czech metrology institute and it is intended to operate as a national nanometrology standard combining local probe microscopy techniques and sample position control with traceability to the primary standard of length.

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“…Scanning over an area below approximately 1 x 1 mm can be done with PZT driven flexture stages with virtually no backlash, and sensitivity and resolution on the nm level or better [10,11]. The design of the stage relies on flexible joints and suffers from the presence of angle deviations over the scanning range.…”

Section: Conceptsmentioning

confidence: 99%

Multiaxis interferometric displacement measurement for local probe microscopy

et al. 2011

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Ê Ú ¾ ÂÙÒ ¾¼½½ ÔØ ½¾ ÇØÓ Ö ¾¼½½ ×ØÖ ØWe present an overview of design approaches for nanometrology measuring setups with a focus on interferometry techniques and associated problems. The design and development of a positioning system with interferometric multiaxis monitoring and control is presented. The system is intended to operate as a national nanometrology standard combining local probe microscopy techniques and sample position control with traceability to the primary standard of length.

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Traceable calibration of transfer standards for scanning probe microscopy

Cited by 68 publications

References 9 publications

Large area high-speed metrology SPM system

Large area high-speed metrology SPM system

Six-axis interferometric coordinates measurement system for nanometrology

Multiaxis interferometric displacement measurement for local probe microscopy

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