Comparison on Nanometrology: Nano 2—Step height

Koenders, Ludger; Bergmans, Rob; Garnaes, Joergen; Haycocks, J; Korolev, Nikolay; Kurosawa, Tomizo; Meli, Felix; Park, B C; Peng, Gong; Picotto, Gian Bartolo; Prieto, Emilio; Gao, Sitian; Smereczynska, B; Vorburger, Theodore V.; Wilkening, G.

doi:10.1088/0026-1394/40/1a/04001

Cited by 56 publications

(51 citation statements)

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“…As for the nominal value of the measured groove depths in this work they ranged from 100 up to 2700 nm, as opposed to measured step heights from NANO2 that were in the range from 7 to 800 nm [7].…”

Section: Evaluation Of Comparison Datamentioning

confidence: 94%

Groove depth measurements on roughness reference standards of the Croatian National Laboratory for Length (LFSB)

Baršić¹,

Mahović²,

Picotto³

et al. 2011

Meas. Sci. Technol.

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In the Laboratory for Precise Measurements of Length, LFSB, which is now the Croatian National Laboratory for Length, unique roughness reference standards were developed in the year 1986. Because of the world-class quality of those standards and their measuring features, the same were sold in several European countries, and today they, among others, are used as roughness reference standards in Italy, Slovenia and Croatia. However, especially in the last decade, there was significant progress in the field of nanotechnology that led to the development of new measuring equipment. The above-mentioned standards due to their size, production technology and measuring features cannot fully meet metrological requirements in the field of nanometrology, i.e. they are not compatible with scanning probe microscopes. Therefore, it was decided to search for possible limitations in the procedure of groove depth measurements on the LFSB standards. In order to include as many measuring devices as possible, i.e. measurement methods, in this research, in 2008 the LFSB launched EURAMET Project 1012 'Limitations of methods for measuring the depth of the groove' in collaboration with national metrology institutes of Italy and Egypt. In this paper the results of measurements performed within the project are presented, and based on the obtained results, the advantages and limitations of the LFSB standards have been discussed, with recommendations for their improvement.

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Section: Evaluation Of Comparison Datamentioning

confidence: 94%

Groove depth measurements on roughness reference standards of the Croatian National Laboratory for Length (LFSB)

Baršić¹,

Mahović²,

Picotto³

et al. 2011

Meas. Sci. Technol.

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“…Since then three of these international comparisons in the field of nanometrology have taken place: NANO4 (1D gratings) [2], NANO3 (line scales) [3], and NANO2 (step height) [4]. SPMs together with some other techniques were used in the NANO2 and NANO4 comparisons to measure vertical and lateral dimensions.…”

Section: Introductionmentioning

confidence: 99%

Height and Pitch at Nanoscale – How Traceable is Nanometrology?

Koenders¹,

Meli²

2005

Nanoscale Calibration Standards and Methods

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Three international comparisons (NANO2, NANO3, and NANO4) were performed in the field of nanometrology between 1999 and 2002. Two of them, NANO2 (step height) and NANO4 (1D pitch), included scanning probe microscopes (SPM) for the first time. It was therefore important for the SPMs to perform successfully in order to show their full potential for dimensional metrology. Other techniques used in the comparisons were optical diffraction and optical microscopy for pitch measurements and stylus instruments and interference microscopes for step-height measurements. We present results of these two comparisons and compare the results and the uncertainties obtained by SPM with those of the other techniques. Both comparisons showed that most of the participants were able to make reasonable estimates of measurement uncertainties. The ranges of uncertainties estimated were in a small range for step-height measurements whereas they varied by a factor of 660 for the pitch measurements. IntroductionThe ability to measure small dimensions is of vital interest in micro-and nanotechnology. Contact stylus instruments, optical instruments, and scanning probe microscopes (SPMs) are all capable of making high-resolution dimensional measurements of small surface structures. More and more users of such instruments also require traceability of their lateral and vertical measurements. Traceability means that a measured result can be related to stated references, usually national or international standards, through an unbroken chain of comparisons, that all have stated uncertainties. The traceability can be realized by calibration of the instruments using lateral (pitch) and vertical (step height or groove depth) standards [1]. For the calibration of such standards it is essential to establish traceability to the SI unit of length. This is done in National Metrology Institutes

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“…One such sample was used during an international comparison of step heights referred to as "Nano 2." 13 The comparison was one of a series of comparisons in nanometrology coordinated by the Bureau International des Poids et Measures ͑BIPM͒. 14 The sample was initially measured using the calibrated atomic force microscope ͑C-AFM͒ at NIST, a metrology AFM with direct traceability to the SI definition of length through the use of displacement interferometry, and a stabilized 633-nm helium neon laser.…”

Section: Height Uncertaintymentioning

confidence: 99%

Progress on implementation of a reference measurement system based on a critical-dimension atomic force microscope

Orji

2007

J. Micro/Nanolith. MEMS MOEMS

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The National Institute of Standards and Technology ͑NIST͒ and SEMATECH are working to address traceability issues in semiconductor dimensional metrology. In semiconductor manufacturing, many of the measurements made in the fab are not traceable to the SI unit of length. This is because a greater emphasis is often placed on precision and tool matching than on accuracy. Furthermore, the fast pace of development in the industry makes it difficult to introduce suitable traceable standard artifacts in a timely manner. To address this issue, NIST and SEMATECH implemented a critical-dimension atomic-force-microscopebased reference measurement system ͑RMS͒. The system is calibrated for height, pitch, and width, and has traceability to the SI definition of length in all three axes. Because the RMS is expected to function at a higher level of performance than inline tools, the level of characterization and handling of uncertain sources is on a level usually seen in instruments at national measurement institutes. In this work, we discuss recent progress in reducing the uncertainty of the instrument as well as details of a newly implemented performance monitoring system. We also present an example of how the RMS concept can be used in a semiconductor manufacturing environment.

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Comparison on Nanometrology: Nano 2—Step height

Cited by 56 publications

References 0 publications

Groove depth measurements on roughness reference standards of the Croatian National Laboratory for Length (LFSB)

Groove depth measurements on roughness reference standards of the Croatian National Laboratory for Length (LFSB)

Height and Pitch at Nanoscale – How Traceable is Nanometrology?

Progress on implementation of a reference measurement system based on a critical-dimension atomic force microscope

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