Quasi van der Waals epitaxy (QvdWE) of III-V semiconductors on two-dimensional layered material, such as graphene, is discussed. Layered materials are used as a lattice mismatch/thermal expansion coefficient mismatch-relieving layer to integrate III-V semiconductors on any arbitrary substrates. In this chapter, the epitaxial growth of both III-V nanowires and thin films on two-dimensional layered materials is presented. Also, the growth challenges of thin film on two-dimensional materials using QvdWE are discussed through density functional theory calculations. Furthermore, optoelectronic devices of III-V semiconductors integrated on two-dimensional layered material based on QvdWE are overviewed to prove the future potential and importance of such type of epitaxy.

GaMnAs structures were grown on GaAs(100) substrates by molecular beam epitaxy employing different growth parameters. We studied manganese incorporation employing secondary ion mass spectrometry (SIMS). At a growth temperature of 300 °C, we observed a self-assembled modulation of the manganese concentration. SIMS depth profiles were analyzed employing a depth resolution function taking into account sputtering-induced broadening of the original distribution and segregation. We found a Mn segregation length along the growth direction of ∼4 nm. The presence of GaMnAs multilayers was corroborated by high-resolution x-ray diffraction. Spinodal decomposition is a possible mechanism for the spontaneous formation of the multilayer structure.

The molecular beam epitaxial (MBE) growth of InAs nanostructures on GaAs(631)‐oriented substrates is studied by photoluminescence (PL) and photoreflectance spectroscopy (PR). First, a corrugated surface conformed by regularly spaced grooves aligned along the [$ \bar 5 $93] azimuth was formed by the GaAs homoepitaxial growth on the (631) substrate. On this template, we proceeded with the deposition of InAs at several thicknesses in the range of 1 to 4.5 monolayers (MLs). An atomic force microscopy (AFM) analysis of samples without GaAs capping, revealed that assemblage of QDs occurs only after the deposition of the equivalent to ∼1.9 ML of InAs. On these samples, we observed changes on the PR line‐shape in the near‐bandgap GaAs region linked to the quantity of InAs deposited. The intensity of the built in electric fields was correlated with the strain state at the heterointerface, as a consequence of the self induced piezoelectric effect, typical from high index surfaces. On the other hand, when the samples were capped with a 100 Å thick GaAs layer, strong emission of the nanostructures occurs even for deposited quantities of InAs as low as 1 ML. Since for this InAs thickness the self‐assemblage of QDs is not observed, the optical transitions observed were associated with the optical emission of self assembled semiconductor quantum wires, promoted by surface diffusion anisotropy, characteristic of the (631) plane. (© 2009 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)

InN epitaxial films with cubic phase were grown by rf-plasma-assisted molecular beam epitaxy (RF-MBE) on GaAs(001) substrates employing two methods: migration-enhanced epitaxy (MEE) and conventional MBE technique. The films were synthesized at different growth temperatures ranging from 490 to 550 °C, and different In beam fluxes (BEPIn) ranging from 5.9 × 10−7 to 9.7 × 10−7 Torr. We found the optimum conditions for the nucleation of the cubic phase of the InN using a buffer composed of several thin layers, according to reflection high-energy electron diffraction (RHEED) patterns. Crystallographic analysis by high resolution X-ray diffraction (HR-XRD) and RHEED confirmed the growth of c-InN by the two methods. We achieved with the MEE method a higher crystal quality and higher cubic phase purity. The ratio of cubic to hexagonal components in InN films was estimated from the ratio of the integrated X-ray diffraction intensities of the cubic (002) and hexagonal (101¯1) planes measured by X-ray reciprocal space mapping (RSM). For MEE samples, the cubic phase of InN increases employing higher In beam fluxes and higher growth temperatures. We have obtained a cubic purity phase of 96.4% for a film grown at 510 °C by MEE.

In the present work, we study the growth by molecular beam epitaxy of InAs self-assembling quantum dots (SAQDs) on GaAs(100) substrates subjected to an in situ annealing treatment. The annealing process consists of the exposition of the GaAs buffer layer surface to high temperatures for a few seconds with the shutter of an arsenic Knudsen cell closed. The purpose of the annealing is to obtain a better uniformity of the SAQD sizes. In our study we prepared different samples using the Stranski-Krastanov growth method to obtain InAs/GaAs(100) quantum dot samples with different annealing times and temperatures. Their structural and optical properties were studied by reflection high-energy electron diffraction (RHEED), high-resolution scanning electron microscopy (HRSEM), atomic force microscopy (AFM), and photoreflectance spectroscopy (PR). According to the results of AFM and HRSEM, by the thermal treatment we obtained a better distribution of quantum dot sizes in comparison with a reference sample with no treatment. The PR spectra from 0.9 to 1.35 eV presented two transitions associated with SAQDs. The energy transitions were obtained by fitting the PR spectra using the third derivative model.

Traditional techniques for cancer diagnosis, such as nuclear magnetic resonance, ultrasound and tissue analysis, require sophisticated devices and highly trained personnel, which are characterized by elevated operation costs. The use of biomarkers has emerged as an alternative for cancer diagnosis, prognosis and prediction because their measurement in tissues or fluids, such as blood, urine or saliva, is characterized by shorter processing times. However, the biomarkers used currently, and the techniques used for their measurement, including ELISA, western-blot, polymerase chain reaction (PCR) or immunohistochemistry, possess low sensitivity and specificity. Therefore, the search for new proteomic, genomic or immunological biomarkers and the development of new noninvasive, easier and cheaper techniques that meet the sensitivity and specificity criteria for the diagnosis, prognosis and prediction of this disease has become a relevant topic. The purpose of this review is to provide an overview about the search for new cancer biomarkers, including the strategies that must be followed to identify them, as well as presenting the latest advances in the development of biosensors that possess a high potential for cancer diagnosis, prognosis and prediction, mainly focusing on their relevance in lung, prostate and breast cancers.

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Graphene is an ideal candidate for building microelectromechanical system (MEMS) devices because of its extraordinary electronic and mechanical properties. Some research has been done to study the MEMS pull-in phenomenon in suspended graphene, but no one has yet considered the effects of polymer residue. Polymer residue is an inevitable consequence when transferring polycrystalline graphene (PCG) grown using chemical vapor deposition, the most common graphene growth method. Polymer residue is also introduced when using photolithography to build MEMS devices. In this paper, the authors study the effects of polymer residue on the pull-in of suspended PCG ribbon devices and find that thick polymer residues cause a variation in pull-in voltage. However, after removing most of the polymer residue using a more abrasive chloroform treatment, the authors find that the graphene structure is no longer able to suspend itself as the graphene-substrate interaction energy becomes greater than the strain energy needed to conform graphene to the substrate. Therefore, polymer residue is found to cause variation in the pull-in voltage but is also found to help in graphene’s suspension at high length to displacement ratios.