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Wafer bonding is a crucial process for fabricating microsystems. Within this study, the polymer parylene was used to establish a low-temperature adhesive wafer bonding process for wafers of 150 and 200 mm diameters. The bonding process was investigated for silicon and glass wafers with different additional coatings including silicon dioxide, silicon nitride, aluminum, and parylene C. Important process parameters such as bonding temperature and time were also investigated and the parylene adhesive was analyzed in detail with respect to its dimensions and type. The performance of the parylene bonding was characterized in different aspects, including mechanical tests, cross-sectional scanning electron microscopy, infrared light transmission, and different hermeticity tests. The reliability of the parylene bonded compounds was also investigated with respect to constant loading, mechanical shocking, and thermal cycling. As a result, the parylene bonding is feasible with various materials and shows high tensile and shear strengths of up to 35 MPa and 80 MPa, respectively. Hermeticity was excellent, with a helium leakage rate lower than 10‒7 mbar∙l s−1. The parylene bonded compounds were proven to feature high reliability. Finally, application of the superior properties of the parylene bonding was demonstrated with respect to the fabrication of different three-dimensional structures.

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The ongoing miniaturization and implementation of new functionalities into micro-electro-mechanical systems (MEMS) demand the development and application of new wafer bonding and encapsulation technologies with a high performance. Requirements are low process temperatures, high mechanical strengths of the bonded interface, as well as the applicability on large wafer sizes. Within the presented study, the polymer Parylene C was used as an adhesive for the bonding of 6” and 8” wafers. Doing so, the material combinations of the wafers, the Parylene thicknesses and geometries as well as the bonding parameters were varied. The properties of the wafer compounds were characterized with various methods, including mechanical tests, infrared imaging, cross-sections, hermeticity tests and the investigation of the thermal reliability. Using the Parylene C bonding process, tensile strengths of up to 35 MPa, and shear strengths of up to 80 MPa were realized. The determined helium leakage rate was lower than 1 ∙ 10-7 mbar ∙ l/s and the thermal reliability was verified to be excellent.

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This paper discusses approaches for the isolation of deep high aspect ratio through silicon vias (TSV) with respect to a Via Last approach for micro-electro-mechanical systems (MEMS). Selected TSV samples have depths in the range of 170…270 µm and a diameter of 50 µm. The investigations comprise the deposition of different layer stacks by means of subatmospheric and plasma enhanced chemical vapour deposition (PECVD) of tetraethyl orthosilicate; Si(OC2H5)4 (TEOS). Moreover, an etch-back approach and the selective deposition on SiN were also included in the investigations. With respect to the Via Last approach, the contact opening at the TSV bottom by means of a specific spacer-etching method have been addressed within this paper. Step coverage values of up to 74 % were achieved for the best of those approaches. As an alternative to the SiO2-isolation liners a polymer coating based on the CVD of Parylene F was investigated, which yields even higher step coverage in the range of 80 % at the lower TSV sidewall for a surface film thickness of about 1000 nm. Leakage current measurements were performed and values below 0.1 nA/cm2 at 10 kV/cm were determined for the ParyleneF films which represents a promising result for the aspired application to Via Last MEMS-TSV

The polymer Parylene combines a variety of excellent properties and, hence, is an object of intensive research for packaging applications, such as the direct encapsulation of medical implants. Moreover, in the past years, an increasing interest for establishing new applications for Parylene is observed. These include the usage of Parylene as a flexible substrate, a dielectric, or a material for MEMS, e.g., a bonding adhesive. The increasing importance of Parylene raises questions regarding the long-term reliability and aging of Parylene as well as the impact of the aging on the Parylene properties. Within this paper, we present the first investigations on non-accelerated Parylene C aging for a period of about five years. Doing so, free-standing Parylene membranes were fabricated to investigate the barrier properties, the chemical stability, as well as the optical properties of Parylene in dependence on different post-treatments to the polymer. These properties were found to be excellent and with only a minor age-related impact. Additionally, the mechanical properties, i.e., the Young’s modulus and the hardness, were investigated via nano-indentation over the same period of time. For both mechanical properties only, minor changes were observed. The results prove that Parylene C is a highly reliable polymer for applications that needs a high long-term stability.

Hermetic and mechanically strong glass-to-metal seals are required for many applications in technological fields such as aerospace engineering or medical engineering. While traditional glass-to-metal bonding technologies require melting of the glass, modern technologies such as anodic bonding use glass in its solid state. In this publication, a novel glassto-metal bonding method with process temperatures around the softening point of the glass material is investigated. A glass window (silica based crown glass B270) in a titanium (grade 5) housing is manufactured by applying compressive force to the glass in a controlled low pressure argon atmosphere. Adherence of the glass-to-metal interface is determined with a universal testing machine. Hermeticity is measured directly with either pressure gain test or helium leak test. Experiments were performed in a full factorial design with 3 different process temperatures, 3 different process forces and 3 different methods for preparing the titanium surface. The results indicate that the bonding method is capable of producing hermetic seals with leak rates below 10 −8 mbar l/s. Roughening of the metal surface generally improves both hermeticity and interface strength. Bonding strength can be further improved by increasing either processes temperature or, especially for rough surfaces, process force. For improving hermeticity either processes temperature or, especially for smooth surfaces, process force must be increased. The results indicate that successful bonding of glass and titanium with the new bonding method is influenced by the effects of mechanical interlocking and chemical reactions at the material interface.