Abstract. In this work, for the first time we present a magnetron with a sputtering unit used to deposit films of two metal alloys and binary solid solutions of simple compounds (oxides and nitrides). This unit contains two metal targets located on the same axis. The inner (cold) target is effectively cooled by running water, the outer (hot) target is cooled through the fastening elements and by radiation. The inner target is sputtered through slots in the outer target. Current voltage characteristics of a new magnetron working on direct current in inert and reactive environments have been studied. In pure argon with a low current, the V-I characteristics correspond to the mode of abnormal glow discharge, when the current increases, a maximum appears. In the reactive Ar + N 2 environment, the V-I characteristics have a maximum and three sections corresponding to the nitride, transition and metal modes of operation of the sputtering unit.
The discharge current-voltage characteristics of a dc magnetron with a single hot titanium target in Ar + O2 environment are studied. It was found that the I-V characteristics measured in the range of current densities of 10-200 mA/cm2 have three inflection points and a maximum. The competition of several processes can cause the discovered features. In the oxide target operating mode, these processes include the chemical reaction for the formation of oxide on the surface of the target and its sputtering by argon ions. In the metal mode, gas rarefaction near the target and thermionic emission compete.
The influence of nitrogen flow rate on the discharge I-V characteristics of a dc magnetron with a single hot titanium target is studied. The basic processes forming the discharge are determined. The discharge physical models are proposed.
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