Studying heating of magnetron target based on measurement of substrate temperature

Шаповалов, В. М.; Minzhulina, E. A.

doi:10.1016/j.vacuum.2019.01.001

Cited by 15 publications

(5 citation statements)

References 20 publications

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“…Но они дают значительную погрешность, поскольку пирометром интегрирует оптический спектр разряда в ИК-области, который представляет собой комбинацию спектров испускания тлеющего разряда и теплового излучения мишени. Зависимость температуры мишени от плотности тока разряда, которая была использована при подготовке настоящей работы, определяли по методике, использованной в [35,36]. Методика основана на измерении оптических спектров разряда.…”

Section: анализ реактивного распыления горячей титановой мишени в среunclassified

Горячая Мишень. Физико-Химическая Модель Реактивного Распыления

Шаповалов¹

2019

Журнал Технической Физики

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Получила развитие неизотермическая физико-химическая модель реактивного распыления. Новый вариант модели описывает распыление горячей металлической мишени в смеси аргона и одного реактивного газа. Синтез пленки на всех поверхностях вакуумной камеры задан в форме поверхностной химической реакции. Для математического описания реакции использован основной постулат химической кинетики с учетом уравнения изотермы Ленгмюра и уравнения Аррениуса в неизотермических условиях. Зависимость температуры мишени от плотности тока разряда определена по результатам измерения спектров разряда в ближнем ИК-диапазоне. Для аналитического описания модели предложена система из восьми алгебраических уравнений. С ее помощью выполнен анализ влияния плотности тока и расхода реактивного газа на процесс реактивного распыления горячей титановой мишени в смеси аргон + азот при плотности тока 25−600 A/m 2 . Установлено, что разогрев мишени смещает точки изменения режимов работы мишени в область меньших расходов азота и уменьшает ширину петли гистерезиса по сравнению с холодной мишенью. При этом влияние испарения мишени на процесс начинает проявляться при плотности тока более 400 A/m 2 .

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Section: анализ реактивного распыления горячей титановой мишени в среunclassified

Горячая Мишень. Физико-Химическая Модель Реактивного Распыления

Шаповалов¹

2019

Журнал Технической Физики

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“…Nb has a relatively low thermal conductivity (54 W (m•K) −1 ) and a high melting point (2750 K at 1 atmosphere). All these features put Nb into a rather different category of materials, as compared to those used for the HMS systems so far (Ti [3,6,9,10], Cr [5,11], Cu [12], Ni [13], Si [14], Li [15]). Nevertheless, Nb-based coatings are attractive for research community due to their high corrosion resistance [16], good biocompatibility [17], and superconducting properties [18].…”

Section: Introductionmentioning

confidence: 99%

Target heating and plasma dynamics during hot magnetron sputtering of Nb

Leonova¹,

Britun²,

Konstantinidis³

2022

J. Phys. D: Appl. Phys.

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In this work, the direct current (DC) hot magnetron sputtering (HMS) of Nb has been studied and compared with the conventional cold magnetron sputtering (CMS) discharge. Particularly, these two magnetron systems were investigated in terms of current-voltage trends, behaviour of spectral lines, target temperature, and deposition rate. The current-voltage evolution showing strong variations over time in the HMS system was used to monitor the moment when a thermionic emission becomes considerable. Meanwhile, thanks to the time-resolved optical emission spectroscopy (OES), the dynamics of plasma particles and the population of their electronic levels were analysed as a function of the target temperature. The target temperature was measured owing to both pyrometry and OES-based approach, i.e., by fitting an emission spectrum baseline. Finally, in the configuration used in this work, the deposition rate up to 100 nm/min was obtained at the applied power density of 30 W/cm2, which is 3 times higher than the maximum power density applicable to the classical CMS system. However, with further increase in the power density, the deposition rate values were found to be saturated, which is likely caused by a significant increment in a number of thermal electrons in the discharge area.

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“…Moreover, the heating of target induced by ion bombardment cannot be adjusted and controlled properly regardless the plasma properties. The precise knowledge (and the control) of the target temperature is also experimentally challenging either by using thermocouples, thermopiles (heat flux sensor), pyrometers or by analysing thermal radiation spectrum using visible or near-IR spectrometer [33,34].…”

Section: Introductionmentioning

confidence: 99%

“…Modelling all the physical mechanisms occurring inside target/magnetron system (IR radiation loss, sputtering at high temperature, evaporation, enthalpy modification, heat propagation, residual cooling by conduction) and at surface (ion reflection, electron secondary emission, atom ejection …) to finally estimate target temperature is an interesting approach developed by different groups [34][35][36][37][38].…”

Section: Introductionmentioning

confidence: 99%

Hot target magnetron sputtering process: Effect of infrared radiation on the deposition of titanium and titanium oxide thin films

Graillot-Vuillecot

Thomann

Lecas

et al. 2020

Vacuum

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Titanium-based thin films are synthesized by the magnetron sputtering of a titanium target in pure argon or in a mixture of argon and oxygen (reactive regime) in three experimental configurations: a hot target configuration for which the target is thermally disconnected from the cooled magnetron body, a cold/conventional target configuration, and a cold target configuration with an additional infrared source introduced in the chamber to understand the role of the radiation on thin film properties. In hot configuration, the target temperature and its emissivity are measured and compared to a 0D steady state model taking into account the main different cooling mechanisms. IR radiations constitute the major part of the total energy deposited on the substrate during hot target magnetron sputtering, whereas an increase of target temperature allows a rise of sputtered Ti and Ti + species fluxes and slightly affect their kinetic energy. In reactive regime, the obtained films are constituted of polycrystalline anatase TiO2, and an increase of target/IR source temperature leads to an improvement of crystallinity. In pure argon, hot configuration seems to enhance its porosity, induces columns exhibiting sharp-features, slightly modifies its crystalline properties and helps to decrease internal compressive stress.

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Studying heating of magnetron target based on measurement of substrate temperature

Cited by 15 publications

References 20 publications

Горячая Мишень. Физико-Химическая Модель Реактивного Распыления

Горячая Мишень. Физико-Химическая Модель Реактивного Распыления

Target heating and plasma dynamics during hot magnetron sputtering of Nb

Hot target magnetron sputtering process: Effect of infrared radiation on the deposition of titanium and titanium oxide thin films

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