Modeling of reactive sputtering of hot titanium target in nitrogen and oxygen

Goncharov, A O; Minzhulina, E. A.; Шаповалов, В. М.

doi:10.1088/1757-899x/387/1/012020

Cited by 3 publications

(4 citation statements)

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“…Initial interest in a traditional magnetron with a well-cooled metal target (cold target) made it possible to create a sputter assembly with a hot target [150][151][152][153] and then with a sandwich target [154][155][156][157][158][159]. The study of the processes that occur during film deposition using these tools inevitably led to modeling [160][161][162][163][164][165]. The starting point in this work was the article [46].…”

Section: Nonisothermal Physicochemical Model (The Barybin Model)mentioning

confidence: 99%

“…In [163], we published the results of modeling the reactive sputtering process of a single hot target in a gas mixture of Ar +O2 + N2. The equations describing this model are The results of a more detailed analysis are shown in Figure 23, which presents the dependences ∆Q = Q 1 − Q 2 = f (j) for cold (CT curve) and hot (HT curve) targets.…”

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confidence: 99%

“…In [163], we published the results of modeling the reactive sputtering process of a single hot target in a gas mixture of Ar + O 2 + N 2 . The equations describing this model are similar to ( 73)-( 80), taking into account the features of sputtering of a hot target expressed by formulas ( 81)-( 86).…”

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confidence: 99%

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Modeling of Reactive Sputtering—History and Development

Шаповалов

2023

Materials

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This work critically reviews the evolution of reactive sputtering modeling that has taken place over the last 50 years. The review summarizes the main features of the deposition of simple metal compound films (nitrides, oxides, oxynitrides, carbides, etc.) that were experimentally found by different researchers. The above features include significant non-linearity and hysteresis. At the beginning of the 1970s, specific chemisorption models were proposed. These models were based on the assumption that a compound film was formed on the target due to chemisorption. Their development led to the appearance of the general isothermal chemisorption model, which was supplemented by the processes on the surfaces of the vacuum chamber wall and the substrate. The model has undergone numerous transformations for application to various problems of reactive sputtering. At the next step in the development of modeling, the reactive sputtering deposition (RSD) model was proposed, which was based on the implantation of reactive gas molecules into the target, bulk chemical reaction, chemisorption, and the “knock-on effect”. Another direction of the modeling development is represented by the nonisothermal physicochemical model, in which the Langmuir isotherm and the law of mass action are used. Various modifications of this model allowed describing reactive sputtering processes in more complex cases when the sputtering unit included a hot target or a sandwich one.

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Section: Nonisothermal Physicochemical Model (The Barybin Model)mentioning

confidence: 99%

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confidence: 99%

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Modeling of Reactive Sputtering—History and Development

Шаповалов

2023

Materials

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“…Theoretical description of reactive magnetron sputtering process was given in a number of seminal papers [27][28][29], and reliable calculations can be made using these models. However, only few studies exist on uncooled target behavior in reactive sputtering conditions [30][31][32][33][34], and none of the existing models takes into account both time-dependent nature of pulsed discharge parameters and the target surface poisoning and heating effects. We therefore aim at developing such an extended model that could eventually be applied to predict the properties of hot-target reactive HiPIMS discharge modes.…”

Section: Introductionmentioning

confidence: 99%

Simulation of Target Surface Chemical State in a Hot-Target Hipims Process

2023

Izv. Vyssh. Uchebn. Zaved. Khim. Khim. Tekhnol.

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Теоретически рассмотрено совместное влияние эффектов горячей мишени и импульсного характера разряда на состояние поверхности мишени. Система уравнений описывает состояние мишени посредством значений доли отравленной площади θ1 и θ2, где индекс 1 соответствует моноатомному поверхностному слою, а индекс 2слою под поверхностью (приповерхностному слою). Рассмотрены процессы хемосорбции на поверхности мишени и подложки, распыления атомов химически активного газа из мишени, имплантации ионов химически активного газа в приповерхностный слой, испарения материала и переноса между слоями. Отдельное уравнение связывает атомные потоки химически активного газа на поверхностях мишени и подложки с объемными характеристиками, такими как скорость натекания газа и скорость откачки. Система уравнений решена численно, и представлены тестовые результаты. Вычислены зависимости от времени доли химического соединения на поверхности и в приповерхностных слоях мишени, а также на поверхности подложки, в процессе импульсного магнетронного распыления высокой мощности с неохлаждаемой мишенью. Повторяющийся характер СИМР был учтен заданием тока в виде прямоугольных импульсов длительностью 50-500 мкс с частотой 0,1-1 кГц. Модель предсказывает сильное влияние начальных условий отравления мишени на ход процесса распыления на временном масштабе 20 мс. Показано, что степени отравления поверхностей мишени и подложки характеризуются колебаниями с повышенной амплитудой при увеличении паузы между импульсами, даже если коэффициент заполнения остается постоянным.

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Basic principles of modeling reactive sputtering

Shapovalov

2024

Journal of Applied Physics

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This work describes a number of principles, which are proved to be effective in modeling various physical and chemical processes. In the article, a process model is defined as its representation using another similar (or identical) process built on a number of simplifying assumptions. This model is called physicochemical. The main phenomena on the surfaces and in the gas environment of the sputtering system, used for modeling, are identified. A scheme for deriving a system of equations describing the process is given. An example of modeling based on a non-isothermal surface chemical reaction is described. It shows the possibility of studying experimentally immeasurable dependencies characterizing the process of reactive sputtering. The article is addressed mainly to aspiring researchers who have dared to try to understand the features of reactive sputtering models proposed by different authors.

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Modeling of reactive sputtering of hot titanium target in nitrogen and oxygen

Cited by 3 publications

References 5 publications

Modeling of Reactive Sputtering—History and Development

Modeling of Reactive Sputtering—History and Development

Simulation of Target Surface Chemical State in a Hot-Target Hipims Process

Basic principles of modeling reactive sputtering

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