“…Sputtering is one of the most significant deposition methods utilized for depositing thin films across various applications (industrial coatings on glass, wear-resistant coatings, photovoltaics, electronics and others) [1][2][3]. Among the sputtering techniques, magnetron sputtering is widely employed in the industry but is prone to target poisoning due to hysteresis behavior during reactive sputtering, which also impacts the deposition rate [4][5][6]. Gas flow sputtering (GFS), based on hollow cathode discharge, demonstrates several key advantages over conventional low-pressure sputtering techniques.…”