Reactive magnetron sputtering of hot titanium target in mixture of argon and nitrogen

Шаповалов, В. М.; Minzhulina, E. A.; Шестаков, Д. С.; Kochin, A. V.

doi:10.1088/1742-6596/1281/1/012071

Cited by 1 publication

(2 citation statements)

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“…For the last twenty years at Saint Petersburg Electrotechnical University (LETI, Russia), our group has been studying transition metal oxide, nitride, and oxynitride films deposited by reactive magnetron sputtering [142][143][144][145][146][147][148][149]. Initial interest in a traditional magnetron with a well-cooled metal target (cold target) made it possible to create a sputter assembly with a hot target [150][151][152][153] and then with a sandwich target [154][155][156][157][158][159]. The study of the processes that occur during film deposition using these tools inevitably led to modeling [160][161][162][163][164][165].…”

Section: Nonisothermal Physicochemical Model (The Barybin Model)mentioning

confidence: 99%

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Modeling of Reactive Sputtering—History and Development

Шаповалов

2023

Materials

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This work critically reviews the evolution of reactive sputtering modeling that has taken place over the last 50 years. The review summarizes the main features of the deposition of simple metal compound films (nitrides, oxides, oxynitrides, carbides, etc.) that were experimentally found by different researchers. The above features include significant non-linearity and hysteresis. At the beginning of the 1970s, specific chemisorption models were proposed. These models were based on the assumption that a compound film was formed on the target due to chemisorption. Their development led to the appearance of the general isothermal chemisorption model, which was supplemented by the processes on the surfaces of the vacuum chamber wall and the substrate. The model has undergone numerous transformations for application to various problems of reactive sputtering. At the next step in the development of modeling, the reactive sputtering deposition (RSD) model was proposed, which was based on the implantation of reactive gas molecules into the target, bulk chemical reaction, chemisorption, and the “knock-on effect”. Another direction of the modeling development is represented by the nonisothermal physicochemical model, in which the Langmuir isotherm and the law of mass action are used. Various modifications of this model allowed describing reactive sputtering processes in more complex cases when the sputtering unit included a hot target or a sandwich one.

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Section: Nonisothermal Physicochemical Model (The Barybin Model)mentioning

confidence: 99%

“…In recent years, the hot-target magnetron has gained increased attention among specialists [150][151][152][155][156][157][177][178][179][180][181][182]. A feature of this device is that its target can be heated to melting.…”

Section: Single Hot Target In Ar + X2mentioning

confidence: 99%

Modeling of Reactive Sputtering—History and Development

Шаповалов

2023

Materials

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Reactive magnetron sputtering of hot titanium target in mixture of argon and nitrogen

Abstract: The influence of nitrogen flow rate on the discharge I-V characteristics of a dc magnetron with a single hot titanium target is studied. The basic processes forming the discharge are determined. The discharge physical models are proposed.

Cited by 1 publication

References 7 publications

Modeling of Reactive Sputtering—History and Development

Modeling of Reactive Sputtering—History and Development

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