Magnetron with a sputtering unit for deposition of binary alloy films and solid solutions of two compounds

2023

Materials

This work critically reviews the evolution of reactive sputtering modeling that has taken place over the last 50 years. The review summarizes the main features of the deposition of simple metal compound films (nitrides, oxides, oxynitrides, carbides, etc.) that were experimentally found by different researchers. The above features include significant non-linearity and hysteresis. At the beginning of the 1970s, specific chemisorption models were proposed. These models were based on the assumption that a compound film was formed on the target due to chemisorption. Their development led to the appearance of the general isothermal chemisorption model, which was supplemented by the processes on the surfaces of the vacuum chamber wall and the substrate. The model has undergone numerous transformations for application to various problems of reactive sputtering. At the next step in the development of modeling, the reactive sputtering deposition (RSD) model was proposed, which was based on the implantation of reactive gas molecules into the target, bulk chemical reaction, chemisorption, and the “knock-on effect”. Another direction of the modeling development is represented by the nonisothermal physicochemical model, in which the Langmuir isotherm and the law of mass action are used. Various modifications of this model allowed describing reactive sputtering processes in more complex cases when the sputtering unit included a hot target or a sandwich one.

Section: Nonisothermal Physicochemical Model (The Barybin Model)mentioning

confidence: 99%

Modeling of Reactive Sputtering—History and Development

2023

Materials

Physicochemical model for reactive sputtering of a sandwich target

Journal of Applied Physics

2023

A non-isothermal physicochemical model of reactive sputtering is extended in this work. The new version is used in this work to simulate reactive sputtering of a sandwich target with two plates of different metals located on the same axis. The external plate contains cut-outs through which the internal plate is sputtered. The main independent process parameters are the reactive gas flow introduced into the vacuum chamber, the discharge current density, and the total area of cut-outs in the external plate. The physical model of the process is described by a system containing 14 algebraic equations. Only its numerical solution is possible, which allows studying the sputtering process in detail. The model can be used to estimate the conditions that ensure the deposition of a compound film in a real technological process. The model was used to analyze sputtering of a target with internal titanium and external tantalum plates in oxygen. Application of the model in particular cases of sputtering of single targets showed that it is adequate.

Magnetron with sandwich target for solid composite film deposition Mo _x Cr_1–xN

Kozin

Шестаков

et al. 2021

J. Phys.: Conf. Ser.

In this paper, we consider a technological magnetron equipped with a sandwich target designed for the synthesis of Mo x Cr1–x N composite films with a continuous change in the stoichiometric coefficient x, which provides a smooth change in hardness. In this paper, the relationship between the stoichiometric coefficient x and the geometric factor equal to the relative total area of the slots in the external target is established. It is established that the proposed magnetron with a sandwich target makes it possible to synthesize Mo x Cr1–x N solid composite films with a continuous change in the stoichiometric coefficient x, which provides a smooth change in the hardness from 18 to 33 GPA. In this case, the stoichiometric coefficient can be controlled in the range 0 < x < 0.3, varying the area of the slots in the range 0 < α < 0.5 for the specified values of the discharge current density and nitrogen consumption.