Thin films of SiO(2), TiO(2), Ta(2)O(5), ZrO(2), and the mixed oxide H4 (Merck) have been deposited onto nonheated glass substrates by electron-beam evaporation in commercial coating plants. All depositions have been carried out with ion assistance provided by three different ion or plasma sources (end-hall, plasma, and cold-cathode sources). The optical film properties such as index of refraction, extinction coefficient, light scattering, and absorption have been examined by spectrophotometry, laser calorimetry, and total integrated light-scatter measurements. Surface morphology has been investigated by atomic force microscopy studies. Furthermore, films have undergone sand erosion tests for the determination of relative wear resistance. The film properties are compared for the three different ion sources.
Field strength distributions and perturbations have been investigated in a GTEM cell 1750, which is about 8m long. One of the critical frequencies at 123 MHz has been used to expand the GTEM field structure analysis. At this frequency a rectangular cross section (~3 . 2 0 m; h=1.60 m) is measured with a field sensor, giving E, H fields and phase. In parallel a computer simulation using time domain finite difference code was performed. The results compare favorably well. This means for the first time a numerical model of the GTEM cell is now available and validated.
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