Caesium lead halide perovskites were recently demonstrated to be a relevant class of semiconductors for photonics and optoelectronics. Unlike CsPbBr3 and CsPbI3, the realization of high-quality thin films of CsPbCl3, particularly interesting for highly efficient white LEDs when coupled to converting phosphors, is still a very demanding task. In this work we report the first successful deposition of nanocrystalline CsPbCl3 thin films (70–150 nm) by radio frequency magnetron sputtering on large-area substrates. We present a detailed investigation of the optical properties by high resolution photoluminescence (PL) spectroscopy, resolved in time and space in the range 10–300 K, providing quantitative information concerning carriers and excitons recombination dynamics. The PL is characterized by a limited inhomogeneous broadening (~15 meV at 10 K) and its origin is discussed from detailed analysis with investigations at the micro-scale. The samples, obtained without any post-growth treatment, show a homogeneous PL emission in spectrum and intensity on large sample areas (several cm2). Temperature dependent and time-resolved PL spectra elucidate the role of carrier trapping in determining the PL quenching up to room temperature. Our results open the route for the realization of large-area inorganic halide perovskite films for photonic and optoelectronic devices.

All-dielectric sub-micrometric particles have been successfully exploited for light management in a plethora of applications at visible and near-infrared frequencies. However, the investigation of the intricacies of the Mie resonances at the sub-wavelength scale has been hampered by the limitations of conventional near-field methods. In this paper, we address the spatial and spectral mapping of multipolar modes of a Si island by hyper-spectral imaging. The simultaneous detection of several resonant modes allows us to clarify the role of the substrate and the incidence angle of the impinging light, highlighting spectral splitting of the quadrupolar mode and resulting in different spatial features of the field intensity. We explore theoretically and experimentally such spatial features. Details as small as 200 nm can be detected and agree with simulations based on the finite difference time domain method. Our results are relevant to near-field imaging of dielectric structures, the comprehension of the resonant features of sub-micrometric Mie antennas, beam steering, and the resonant coupling with light emitters. Our analysis suggests a novel approach to control the absorption of a single emitter in the framework of surface enhanced absorption or stimulated emission applications.

We report on a systematic analysis of phosphorus diffusion in silicon on insulator thin film via spin-on-dopant process (SOD). This method is used to provide an impurity source for semiconductor junction fabrication. The dopant is first spread into the substrate via SOD and then diffused by a rapid thermal annealing process. The dopant concentration and electron mobility were characterized at room and low temperature by four-probe and Hall bar electrical measurements. Time-of-flight-secondary ion mass spectroscopy was performed to estimate the diffusion profile of phosphorus for different annealing treatments. We find that a high phosphorous concentration (greater than 1020 atoms cm−3) with a limited diffusion of other chemical species and allowing to tune the electrical properties via annealing at high temperature for short time. The ease of implementation of the process, the low cost of the technique, the possibility to dope selectively and the uniform doping manufactured with statistical process control show that the methodology applied is very promising as an alternative to the conventional doping methods for the implementation of optoelectronic devices.

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All-dielectric, sub-micrometric particles obtained through solid state dewetting of thin SiGe-films have been shown to support Mie resonances together with a high-quality monocrystalline composition and atomically smooth facets. Recently, a precise study on the impact given by the effective complex morphology of a SiGe dewetted nanoparticle to the Mie scattering properties has been provided and carried on through a novel experimental technique called Dark-field Scanning Optical Microscopy. In this work, by means of the same experimental technique and numerical simulations of light scattering, we show how the presence of a pedestal enriched with silicon placed under the SiGe-nanoparticle results in a sharp peak at high energy in the total scattering cross-section. Exploiting a tilted illumination to redirect scattered light, we are able to discriminate the spatial localization of the pedestal-induced resonance. Our results contribute to extending the practical implementations of dewetted Mie resonators in the field of light scattering directionality, sensing applications and show further engineering options beyond the simple isolated-island case.

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Recent advancements in quantum key distribution (QKD) protocols opened the chance to exploit nonlaser sources for their implementation. A possible solution might consist in erbium-doped light emitting diodes (LEDs), which are able to produce photons in the third communication window, with a wavelength around 1550 nm. Here, we present silicon LEDs based on the electroluminescence of Er:O complexes in Si. Such sources are fabricated with a fully-compatible CMOS process on a 220 nm-thick silicon-on-insulator (SOI) wafer, the common standard in silicon photonics. The implantation depth is tuned to match the center of the silicon layer. The erbium and oxygen co-doping ratio is tuned to optimize the electroluminescence signal. We fabricate a batch of Er:O diodes with surface areas ranging from 1 µm × 1 µm to 50 µm × 50 µm emitting 1550 nm photons at room temperature. We demonstrate emission rates around 5 × 106 photons/s for a 1 µm × 1 µm device at room temperature using superconducting nanowire detectors cooled at 0.8 K. The demonstration of Er:O diodes integrated in the 220 nm SOI platform paves the way towards the creation of integrated silicon photon sources suitable for arbitrary-statistic-tolerant QKD protocols.

Quantum Key Distribution allows two users to exchange secret keys and it is based on the transmission of single photons or attenuated laser pulses. Recently, sources based on multiple single-photon emitters were demonstrated to be suitable for QKD. Here, we present a CMOS compatible multiple single-photon emitters source realized on a SOI wafer by a standard silicon diode doped with erbium ions. Particular emphasis is placed on the fabrication of such a device enhancing the erbium electroluminescence signal by adopting a proper oxygen co-doping. Finally, electroluminescence characterization at room temperature of the device is presented.