It was shown that a strong anodic oxidation of 100-oriented diamond induces the electronic surface states, which pin the surface Fermi level at about 3.6 eV above the valence-band maximum. The characteristics of the electronic surface barrier were evaluated from the analysis of boron-doped diamond electrodes and correlated with the four-point probe measurements of an oxidized diamond resistor with a boron delta-doped channel. The same evaluation procedure applied to the case of a wet chemical oxidation yielded a surface barrier of 1.9 eV, which is consistent with the data in the literature. The characteristics of the 3.6 eV barrier by the anodic oxidation remained stable after subsequent chemical treatments even at elevated temperatures, and were also not degraded in air for a long time. The x-ray photoemission spectroscopy study showed that the anodic oxidation generates complex oxygen functionalities, like polycarbonate groups, and also C-O-C bridging bond structures with possible contribution of an additional chemisorbed layer.

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The electrical transport properties of two-dimensional (2D) borondoped delta layers were investigated by a comprehensive analysis of physical, electrochemical and microscopic methods. The boron concentration profile was determined physically by elastic recoil detection (ERD) and compared to the doping (acceptor) profile extracted from capacitance-voltage (CV) measurements, giving a boron concentration of 2-4 Â 10 13 cm À2 . Corresponding field effect transistor (FET) characteristics, based on the boron-doped delta channel concept, measured in electrolyte, show good modulation behaviour but field effect mobilities in the range of 10 À2 -10 À1 cm 2 V À1 s À1 that are far below expected values. High-resolution transmission electron microscopy (HR-TEM) analysis was employed to shed new light on the transport behaviour of boron-doped delta layers, revealing an inhomogeneous and interrupted morphology. Based on this finding, a hypothesis is proposed, modelling the delta layer transport behaviour via hopping and tunnelling processes between boron clusters.