Structural and optical properties of zirconia thin films deposited by reactive high-power impulse magnetron sputtering

Zhao, Xiaoli; Jin, Jie; Cheng, Jui‐Ching; Lee, Jyh-Wei; Wu, Kay L H; Lin, Kuo-Ping; Tsai, Jung-Ruey; Liu, Kou−Chen

doi:10.1016/j.tsf.2014.05.060

Cited by 25 publications

(7 citation statements)

References 46 publications

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“…Zhao et al [116] compared zirconia films deposited on glass and ITO/glass substrates by reactive HiPIMS. The optical transmittance of the films on the glass substrates reached more than 90% in the range of 200-900 nm wavelength, much higher than that prepared by DCMS.…”

Section: Electrical and Optical Coatingsmentioning

confidence: 99%

High power impulse magnetron sputtering and its applications

Yang

Liu

Chen

2018

Plasma Sci. Technol.

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High power impulse magnetron sputtering (HiPIMS) has attracted a great deal of attention because the sputtered material is highly ionized during the coating process, which has been demonstrated to be advantageous for better quality coating. Therefore, the mechanism of the HiPIMS technique has recently been investigated. In this paper, the current knowledge of HiPIMS is described. We focus on the mechanical properties of the deposited thin film in the latest applications, including hard coatings, adhesion enhancement, tribological performance, and corrosion protection layers. A description of the electrical, optical, photocatalytic, and functional coating applications are presented. The prospects for HiPIMS are also discussed in this work.

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Section: Electrical and Optical Coatingsmentioning

confidence: 99%

High power impulse magnetron sputtering and its applications

Yang

Liu

Chen

2018

Plasma Sci. Technol.

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“…Nowadays, there are many methods to prepare ZrO 2 thin film, such as magnetron sputtering [14], atomic layer deposition [15], electron beam evaporation [16], and so on, which are limited to large-scale production and low cost fabrication. To address these issues, we herein introduce a simple solution-based fabrication process with many advantages, such as simplicity, low processing temperature, low cost, stoichiometry control and its ability to produce uniform, chemically homogeneous film over large areas, for a solution-processed ZrO 2 gate insulator [17,18].…”

Section: Introductionmentioning

confidence: 99%

Microstructure, optical and electrical properties of solution-derived peroxo-zirconium oxide gate dielectrics for CMOS application

Xiao

Sun

et al. 2016

Ceramics International

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“…Therefore, the thickest film was deposited in the atmosphere of pure argon (sample 100Ar), while the thinnest with pure oxygen (sample 100Ar) ( Figure 6 ). In the case of ultra-thin films (thickness below 50 nm), the oxygen content in gas atmosphere influences not only film thickness [ 42 ], but refractive index of the film as well [ 54 ].…”

Section: Resultsmentioning

confidence: 99%

High Power Impulse Magnetron Sputtering of In2O3/Sn Cold Sprayed Composite Target

2021

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High Power Impulse Magnetron Sputtering (HiPIMS) was used for deposition of indium tin oxide (ITO) transparent thin films at low substrate temperature. A hybrid-type composite target was self-prepared by low-pressure cold spraying process. Prior to spraying In2O3 and oxidized Sn powders were mixed in a volume ratio of 3:1. Composite In2O3/Sn coating had a mean thickness of 900 µm. HiPIMS process was performed in various mixtures of Ar:O2: (i) 100:0 vol.%, (ii) 90:10 vol.%, (iii) 75:25 vol.%, (iv) 50:50 vol.%, and (v) 0:100 vol.%. Oxygen rich atmosphere was necessary to oxidize tin atoms. Self-design, simple high voltage power switch capable of charging the 20 µF capacitor bank from external high voltage power supply worked as a power supply for an unbalanced magnetron source. ITO thin films with thickness in the range of 30–40 nm were obtained after 300 deposition pulses of 900 V and deposition time of 900 s. The highest transmission of 88% at λ = 550 nm provided 0:100 vol. % Ar:O2 mixture, together with the lowest resistivity of 0.03 Ω·cm.

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Structural and optical properties of zirconia thin films deposited by reactive high-power impulse magnetron sputtering

Cited by 25 publications

References 46 publications

High power impulse magnetron sputtering and its applications

High power impulse magnetron sputtering and its applications

Microstructure, optical and electrical properties of solution-derived peroxo-zirconium oxide gate dielectrics for CMOS application

High Power Impulse Magnetron Sputtering of In2O3/Sn Cold Sprayed Composite Target

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