High power impulse magnetron sputtering and its applications

Yang, L.; Liu, Zhongwei; Chen, Qiang

doi:10.1088/2058-6272/aa9e48

Cited by 13 publications

(4 citation statements)

References 123 publications

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“…For region I, the shift in peak position to higher angle can be explained in light of results presented by Kubart et al [34] which show that at high repetition frequency the reduction in gas density is lower due to lower peak current (see figure 1(b)). The resulting effect is a more pronounced possibility towards target poisoning at low f R , which has been supported by results from [35,36], i.e. with increased time between pulses (i.e.…”

Section: Structural Characterizationsupporting

confidence: 55%

Structural and electrical properties of V₂O₃ thin films on c-plane Al₂O₃ fabricated by reactive-HiPIMS and dcMS techniques

Sultan¹,

Ignatova²,

Thorsteinsson³

et al. 2021

J. Phys. D: Appl. Phys.

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The study presents the synthesis of epitaxial V2O3 thin films on c-plane Al2O3 substrates by reactive high-power impulse (HiPIMS) and direct current (dcMS) magnetron sputtering. The results reveal that for fixed deposition conditions and discharge power, well defined epitaxial layers can be attained using both HiPIMS and dcMS. For dcMS we observe the formation of these epitaxial films down to flow rate values of 1.3 sccm while for HiPIMS we observe an extended operation window down to much lower oxygen flow of 0.5 sccm without sacrificing the structural quality of the films. Furthermore, the effect of varying HiPIMS discharge parameters i.e. repetition frequency and average power for fixed O2 flow setting, were explored in order to determine their effect on the structural quality and electrical characteristics of the films. The magnitude of the metal–insulator transition (MIT) and the transition temperature is correlated to the film stoichiometry which can be fine-tuned by mapping the HiPIMS discharge parameters, displaying a total change in resistance of ∼7 decades over the studied temperature range. The MIT temperature and magnitude obtained for films fabricated by HiPIMS, even for low O2 flow settings (down to 0.6–0.5 sccm), displayed superior characteristics compared to films fabricated by dcMS where a minimum O2 flow of 1.3 sccm was needed.

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Section: Structural Characterizationsupporting

confidence: 55%

Structural and electrical properties of V₂O₃ thin films on c-plane Al₂O₃ fabricated by reactive-HiPIMS and dcMS techniques

Sultan¹,

Ignatova²,

Thorsteinsson³

et al. 2021

J. Phys. D: Appl. Phys.

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“…Over the last ten years, high-power impulse magnetron sputtering (HiPIMS) (Figure 3) has gained interest as a coating deposition technique due to its improvements over conventional PVD techniques producing better-quality films. The main benefits of the process are the formation of highly dense single-phase films with good substrate adhesion and low surface roughness [31]. HiPIMS is a line-of-sight deposition process whereby sputtering of a source occurs in a magnetic field with a high degree of ionization, allowing more collisions to take place near the substrate, forming high purity films.…”

Section: High-power Impulse Magnetron Sputtering (Hipims)mentioning

confidence: 99%

Recent Progress in Precision Machining and Surface Finishing of Tungsten Carbide Hard Composite Coatings

Micallef

Zhuk²,

Aria

2020

Coatings

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Owing to their high hardness, fracture toughness and oxidation resistance, tungsten carbide (WC) coatings are extensively deposited on parts that operate in demanding applications, necessitating wear, erosion, and corrosion resistance. The application of thick and hard WC coatings has an inevitable effect on the original dimensions of the parts, affecting the geometrical tolerances and surface roughness. The capability of achieving a sub-micron surface finish and adhere to tight geometrical tolerances accurately and repeatably is an important requirement, particularly with components that operate in high-precision sliding motion. Meeting such requirements through conventional surface finishing methods, however, can be challenging due to the superior mechanical and tribological properties of WC coatings. A brief review into the synthesis techniques of cemented and binderless WC coatings is presented together with a comprehensive review into the available techniques which are used to surface finish WC-based coatings with reference to their fundamental mechanisms and capabilities to process parts with intricate and internal features. The binderless WC/W coating considered in this work is deposited through chemical vapour deposition (CVD) and unlike traditional cemented carbide coatings, it has a homogenous coating structure. This distinctive characteristic has the potential of eliminating key issues commonly encountered with machining and finishing of WC-based coatings. Here, six contact and non-contact surface finishing techniques, include diamond turning, precision grinding, superfinishing, vibratory polishing, electrical discharge machining, and electropolishing are discussed along with their current use in industry and limitations. Key challenges in the field are highlighted and potential directions for future investigation, particularly on binderless WC coatings, are proposed herein.

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“…Electroplating has been gradually replaced by chemical vapor deposition and physical vapor deposition (PVD) technology. PVD methods, such as magnetron sputtering and cathodic arcs, have the advantage of a wide range of deposition materials, low deposition temperature, high film quality and outstanding adhesion [6,7]. Therefore, PVD has important application potential in coating methods used on the inner surface of a tubular workpiece.…”

Section: Introductionmentioning

confidence: 99%

Improvement of plasma uniformity and mechanical properties of Cr films deposited on the inner surface of a tube by an auxiliary anode near the tube tail

Wu¹,

Tian²,

Zheng³

et al. 2022

Plasma Sci. Technol.

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In order to improve the length of plasma into the whole tube and mechanical properties of Cr films deposited on inner surface of tube, a high-power impulse magnetron sputtering (HiPIMS) coating method with planar cathode target and auxiliary anode was proposed. The auxiliary anode was placed near the tube tail to attract plasma into the inner part of the tube. Cr films was deposited on the inner wall of 20# carbon steel tube with diameter of 40 mm and length of 120 mm. The influence of auxiliary-anode voltage on the discharge characteristics of Cr target, and the structure and mechanical properties of Cr films deposited on the inner surface of tube were explored. With higher auxiliary anode voltage, an increase of substrate current was observed, especially in tube tail. The thickness uniformity, compactness, hardness and H/E ratios of the Cr films deposited on the inner surface of tube increased with the increase of auxiliary anode voltage. The Cr films deposited with auxiliary anode voltage of 60 V exhibited the highest hardness of 9.6 GPa and the lowest friction coefficient of 0.68.

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High power impulse magnetron sputtering and its applications

Cited by 13 publications

References 123 publications

Structural and electrical properties of V₂O₃ thin films on c-plane Al₂O₃ fabricated by reactive-HiPIMS and dcMS techniques

Structural and electrical properties of V₂O₃ thin films on c-plane Al₂O₃ fabricated by reactive-HiPIMS and dcMS techniques

Recent Progress in Precision Machining and Surface Finishing of Tungsten Carbide Hard Composite Coatings

Improvement of plasma uniformity and mechanical properties of Cr films deposited on the inner surface of a tube by an auxiliary anode near the tube tail

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High power impulse magnetron sputtering and its applications

Cited by 13 publications

References 123 publications

Structural and electrical properties of V2O3 thin films on c-plane Al2O3 fabricated by reactive-HiPIMS and dcMS techniques

Structural and electrical properties of V2O3 thin films on c-plane Al2O3 fabricated by reactive-HiPIMS and dcMS techniques

Recent Progress in Precision Machining and Surface Finishing of Tungsten Carbide Hard Composite Coatings

Improvement of plasma uniformity and mechanical properties of Cr films deposited on the inner surface of a tube by an auxiliary anode near the tube tail

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Product

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Structural and electrical properties of V₂O₃ thin films on c-plane Al₂O₃ fabricated by reactive-HiPIMS and dcMS techniques

Structural and electrical properties of V₂O₃ thin films on c-plane Al₂O₃ fabricated by reactive-HiPIMS and dcMS techniques