“…1) the continuity of the a-Si:H layer is maintained after emitter deposition. As a consequence, the V oc is independent of i-layer thickness, with extremely limited spread, confirming that the passivation properties of such layers [6] are preserved after lc deposition, with no degradation of the film continuity nor plasma-induced crystallization [3]. However, due to the more favorable band discontinuity configuration [7], we obtained much larger V oc values for p/n devices, having m/a structure, if a much thicker a-Si:H layer is used [2,3,6], the more convenient approach being still an open point.…”