Precompensation approach for improving the quality of laser direct writing patterns by a modified proximity function

Du, Jinglei

doi:10.1117/1.602426

Cited by 3 publications

(1 citation statement)

References 7 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Although various micro-nano manufacturing methods have also been developed rapidly in the past few decades, such as electron beam lithography (EBL), focused ion beam (FIB), direct laser writing (LDW), and template transfer technology [ 20 , 21 , 22 , 23 ]. However, random factors such as time, temperature, human operation, or inherent physical mechanisms, such as the standing wave effect [ 24 ] and the proximity effect [ 25 ], will introduce certain fabrication errors and affect the final performances. These factors are the challenges faced by any lithography technology.…”

Section: Introductionmentioning

confidence: 99%

The Effect of Fabrication Error on the Performance of Mid-Infrared Metalens with Large Field-of-View

Jia

et al. 2023

Nanomaterials

View full text Add to dashboard Cite

Mid-infrared large field-of-view (FOV) imaging optics play a vital role in infrared imaging and detection. The metalens, which is composed of subwavelength-arrayed structures, provides a new possibility for the miniaturization of large FOV imaging systems. However, the inaccuracy during fabrication is the main obstacle to developing practical uses for metalenses. Here, we introduce the principle and method of designing a large FOV doublet metalens at the mid-infrared band. Then, the quantitative relationship between the fabrication error and the performance of the doublet metalens with a large FOV from four different fabrication errors is explored by using the finite-difference time-domain method. The simulation results show that the inclined sidewall error has the greatest impact on the focusing performance, and the interlayer alignment error deforms the focusing beam and affects the focusing performance, while the spacer thickness error has almost no impact on the performance. The contents discussed in this paper can help manufacturers determine the allowable processing error range of the large FOV doublet metalens and the priority level for optimizing the process, which is of significance.

show abstract

Section: Introductionmentioning

confidence: 99%

The Effect of Fabrication Error on the Performance of Mid-Infrared Metalens with Large Field-of-View

Jia

et al. 2023

Nanomaterials

View full text Add to dashboard Cite

show abstract

Investigation of phase shift mask distortion effect

Cui

Yuan

et al. 2002

Microelectronic Engineering

View full text Add to dashboard Cite

Scalable fabrication of hemispherical solid immersion lenses in silicon carbide through grayscale hard-mask lithography

Bekker

Arshad

Cilibrizzi

et al. 2023

Applied Physics Letters

View full text Add to dashboard Cite

Grayscale lithography allows the creation of micrometer-scale features with spatially controlled height in a process that is fully compatible with standard lithography. Here, solid immersion lenses are demonstrated in silicon carbide using a fabrication protocol combining grayscale lithography and hard-mask techniques to allow nearly hemispherical lenses of 5μm radius to be etched into the substrate. Lens performance was benchmarked by studying the enhancement obtained in the optical collection efficiency for single quantum emitters hosted in silicon carbide. Enhancement by a factor of 4.4 ± 1.0 was measured for emitters not registered to the center of the lens, consistent with devices fabricated through other methods. The grayscale hard-mask technique is highly reproducible, scalable, and compatible with CMOS technology, and device aspect ratios can be tuned after resist patterning by controlling the chemistry of the subsequent dry etch. These results provide a reproducible, low-cost, high-throughput and industrially relevant alternative to focused ion beam milling for the creation of high-aspect-ratio, rounded microstructures for quantum technology, and microphotonic applications.

show abstract

Precompensation approach for improving the quality of laser direct writing patterns by a modified proximity function

Cited by 3 publications

References 7 publications

The Effect of Fabrication Error on the Performance of Mid-Infrared Metalens with Large Field-of-View

The Effect of Fabrication Error on the Performance of Mid-Infrared Metalens with Large Field-of-View

Investigation of phase shift mask distortion effect

Scalable fabrication of hemispherical solid immersion lenses in silicon carbide through grayscale hard-mask lithography

Contact Info

Product

Resources

About